Metal organic precursor molecules

These and similar studies employing more complex organic molecules as guests prove distinct features of the corresponding framework, like extraordinary cavity size or adsorption properties. The loading of MOFs with metal-organic precursor molecules is effected by the combination of the functionality of the precursors to... 

The first step in designing a precursor synthesis is to pick precursor molecules that, when combined in organic solvents, yield the bulk crystalline solid. For metals, a usual approach is to react metal salts with reducing agents to produce bulk metals. The main challenge is to find appropriate metal salts that are soluble in an organic phase. 

Reactions of anionic metal carbonyl complexes with certain onium compounds are also related mechanistically, a neutral molecule rather than an anion being displaced from the organic precursor, e.g. ... 

In chemical vapor deposition (CVD) reactive vapor precursors react to produce solid materials in the gas phase or at the solid-gas interface on the substrate surface at appropriate temperatures. Typical precursors used in the CVD process are metal hydrides, metal chlorides, and metal organic compounds. In the case that the precursor species are metal organic compounds, the process is called metal-organic chemical vapor deposition (MOCVD). The precursor molecules are introduced into a reactor sometimes with a carrier gas and decompose by means of heat, irradiation of UV light, or electrical plasma formed in the gas. Thermal CVD is the most commonly used method. This technique has an advantage that refractory materials can be vapour-deposited at relatively low temperatures,... 

Thin films of Ce02 have been obtained using molecule based metal-organic chemical vapor deposition (MO-CVD). This method is attractive because of the possibility to coat complex shapes and to use lower growth temperatures. The actual application of this technique was accomplished for the first time using a newly developed Ce precursor molecule to grow Cc02 on YSZ(IOO). The method... 

Two types of precursor can be used in CVD of superconducting mixed oxides metal halides and metal-organics The use of metal-organic molecules results in some carbon in the films, which can hinder performance, so metal halides gained popularity in early work. Halide precursors call for a much higher deposition temperature. In the case of metal halide reactions, the chemistry follows that presented earlier (see 17.2.5.2.2) but with multiple reactions occurring simultaneously. The gas phase composition and temperature are controlled to obtain the desired stoichiometry. An example of such a reaction would be that used to make Bi2Sr2CaCu20s+ c(or Bi-2212) at 760-820°C ... 

Lin and co-workers [177] have studied self-constructing arrays of individual Fe-l,2,4-benzenetricarboxyhc acid (Fe-tmla) complexes on a Cu(lll) substrate, produced by OMBE deposition of precursor tmla adlayers and iron atoms in ultrahigh vacuum. These selfconstructed metal-organic arrays (of four tmla molecules per one Fe atom) form large homochiral monolayers (i.e. both S and R chirality are found) extending laterally up to 200 nm. 

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