Lithography micro

In Proceedings of 21st SemiTherm Symposium, San Jose, 15-17 March 2005, pp 354—360 Mohr J, Ehrfeld W, Munchmeyer D (1988) Requirements on resist layers in deep-etch synchrotron radiation lithography. J Vac Sci Technol B6 2264-2267 Morini GL (2004) Single phase convective heat transfer in micro-channels overview of experimental results. Int J Thermal Sci 43 631-651... 

To realize micro reactors with sensing and surface-control structures, the underlying fabrication methods have to go beyond MEMS and classical micro machining [75]. Plastic and glass manufacture and also novel innovative methods such as soft lithography have to be developed further and applied. 

Simeone FC, Albonetti C, Cavallini M (2009) Progress in micro- and nanopatteming via electrochemical lithography. J Phys Chem C 113 18987-18994... 

Ni-YSZ cermets deposited by RF sputtering (230 nm) were found to have micro-structural features consisting of columnar grains 13 to 75 nm long and 9 to 22 nm wide, and showed good adhesion to the YSZ layer on which they were deposited [128], In a three-layer Ni-YSZ-Ni film deposited on NiO by RF sputtering in another study, the YSZ layer exhibited a columnar structure with some pinholes [129], Microstructural and electrochemical features of Pt electrodes patterned by lithography on YSZ have also been studied [130,131]. 

Abstract Optical techniques for three-dimensional micro- and nanostructuring of transparent and photo-sensitive materials are reviewed with emphasis on methods of manipulation of the optical field, such as beam focusing, the use of ultrashort pulses, and plasmonic and near-field effects. The linear and nonlinear optical response of materials to classical optical fields as well as exploitation of the advantages of quantum lithography are discussed. 

The micro mixer was fabricated by UV lithography of SU-8 [54], Two lithography masks were employed, one for the inlet and outlet channels and sidewalls and the other for making the array of micro nozzles. A non-conventional tilted lithographic method was used. A thick layer of SU-8 was exposed at 45° and -45° as well as other angles. A special resist development technique for the small and deep nozzle structures also had to be explored. 

Fig. 1. The accuracy of e-beam lithography is illustrated in the scanning electron micrograph (top). The size of the features formed in the silicon oxide is 0.5 pm and the typical animal cell (a fibroblast) has a diameter of 20 pm. This kind of cell adheres actively to surfaces, forming thin filopodia which here have all attached to the micro-hillocks. Semiconductor technology is capable of manufacturing micro-electrodes, sensors, pores and electronic networks with sizes smaller than that of the cell. The lower illustration summarises the main detection and measuring methods currently in use...

Unger, M.A., Chou, H., Thorsen, T., Scherer, A., Quake, S.R., Monolithic micro-fabricated valves and pumps by multilayer soft lithography. Science 2000, 288, 113-116. 

Y. Inaki, M. J. Moghaddam, K. Takemoto, Pyrimidine Derivatives as Lithographic Materials, in E. Reichmanis (Ed.), Polymers in Micro-lithography Materials and Processes, ACS, Washington DC, 1989. 

Soft lithography is an emerging method for micro- and nanofabrication of two- or three-dimensional structures on surfaces.73 78 This method developed by Whitesides and coworkers uses elastomeric stamps, molds, and conformable photomasks for creating patterns as small as tens of nanometers on substrates. Depending on the... 

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