Kinetics rate-limiting steps

CHEMICAL KINETICS Rate-limiting step in inner-sphere coordination,... 

Fiarticle morphology porosity, relative length scale of polymer and pore phases, particle shape, distribution of phases in high-impact polypropylene Interphase heat and mass transfer phenomena Intraphase heat and mass transfer phenomena Observed kinetics, rate limiting steps Phase equilibrium, monomer sorption and desorption in polymer phase, diffusion Fbrticle agglomeration Micromixi ng... 

Electrode kinetics lend themselves to treatment usiag the absolute reaction rate theory or the transition state theory (36,37). In these treatments, the path followed by the reaction proceeds by a route involving an activated complex where the element determining the reaction rate, ie, the rate limiting step, is the dissociation of the activated complex. The general electrode reaction may be described as ... 

For a sequenee of reaetion steps two more eoneepts will be used in kinetics, besides the previous rules for single reaetions. One is the steady-state approximation and the seeond is the rate limiting step eoneept. These two are in strict sense incompatible, yet assumption of both causes little error. Both were explained on Figure 6.1.1 Boudart (1968) credits Kenzi Tamaru with the graphical representation of reaction sequences. Here this will be used quantitatively on a logarithmic scale. 

Remarks The aim here was not the description of the mechanism of the real methanol synthesis, where CO2 may have a significant role. Here we created the simplest mechanistic scheme requiring only that it should represent the known laws of thermodynamics, kinetics in general, and mathematics in exact form without approximations. This was done for the purpose of testing our own skills in kinetic modeling and reactor design on an exact mathematical description of a reaction rate that does not even invoke the rate-limiting step assumption. 

The UCKRON AND VEKRON kinetics are not models for methanol synthesis. These test problems represent assumed four and six elementary step mechanisms, which are thermodynamically consistent and for which the rate expression could be expressed by rigorous analytical solution and without the assumption of rate limiting steps. The exact solution was more important for the test problems in engineering, than it was to match the presently preferred theory on mechanism. 

The ratio of products 15 and 16 is dependent on the structures, base, and the solvent. The kinetics of the reaction is likewise dependant on the structures and conditions of the reaction. Thus addition or cyclization can be the rate-determining step. In a particularly noteworthy study by Zimmerman and Ahramjian, it was reported that when both diastereomers of 20 were treated individually with potassium r-butoxide only as-epoxy propionate 21 was isolated. It is postulated that the cyclization is the rate-limiting step. Thus, for these substrates, the retro-aldolization/aldolization step reversible. ... 

Much evidence has been obtained in support of the El mechanism. For example, El reactions show first-order kinetics, consistent with a rate-limiting spontaneous dissociation process, l- urthermore, El reactions show- no deuterium isotope effect because rupture of the C—H (or C—D) bond occurs after the rate-limiting step rather than during it. Thus, we can t measure a rate difference between a deuterated and nondeuterated substrate. 

The S il reaction occurs when the substrate spontaneously dissociates to a carbocation in a slow rate-limiting step, followed by a rapid reaction with the nucleophile. As a result, SN1 reactions are kinetically first-order and take place with racemization of configuration at the carbon atom. They are most favored for tertiary substrates. Both S l and S 2 reactions occur in biological pathways, although the leaving group is typically a diphosphate ion rather than a halide. 

In the El reaction, C-X bond-breaking occurs first. The substrate dissociates to yield a carbocation in the slow rate-limiting step before losing H+ from an adjacent carbon in a second step. The reaction shows first-order kinetics and no deuterium isotope effect and occurs when a tertiary substrate reacts in polar, nonbasic solution. 

First-order reaction (Section 11.4) A reaction whose rate-limiting step is unimolecular and whose kinetics therefore depend on the concentration of only one reactant. 

The kinetics of the contributory rate processes could be described [995] by the contracting volume equation [eqn. (7), n = 3], sometimes preceded by an approximately linear region and values of E for isothermal reactions in air were 175, 133 and 143 kJ mole-1. It was concluded [995] that the rate-limiting step for decomposition in inert atmospheres is NH3 evolution while in oxidizing atmospheres it is the release of H20. A detailed discussion of the reaction mechanisms has been given [995]. Thermal analyses for the decomposition in air [991,996] revealed only the hexavanadate intermediate and values of E for the two steps detected were 180 and 163 kJ mole-1. 

As with the decompositions of single solids, rate data for reactions between solids may be tested for obedience to the predictions of appropriate kinetic expressions. From the identification of a satisfactory representation for the reaction, the rate-limiting step or process may be identified and this observation usually contributes to the formulation of a reaction mechanism. It was pointed out in Sect. 1, however, that the number of parameters which must be measured to define completely all contributory reactions rises with the number of participating phases. The difficulties of kinetic analyses are thereby also markedly increased and the factors which have to be considered in the interpretation of rate data include the following. 

The reaction of Si02 with SiC [1229] approximately obeyed the zero-order rate equation with E = 548—405 kJ mole 1 between 1543 and 1703 K. The proposed mechanism involved volatilized SiO and CO and the rate-limiting step was identified as product desorption from the SiC surface. The interaction of U02 + SiC above 1650 K [1230] obeyed the contracting area rate equation [eqn. (7), n = 2] with E = 525 and 350 kJ mole 1 for the evolution of CO and SiO, respectively. Kinetic control is identified as gas phase diffusion from the reaction site but E values were largely determined by equilibrium thermodynamics rather than by diffusion coefficients. 

Theoretical models available in the literature consider the electron loss, the counter-ion diffusion, or the nucleation process as the rate-limiting steps they follow traditional electrochemical models and avoid any structural treatment of the electrode. Our approach relies on the electro-chemically stimulated conformational relaxation control of the process. Although these conformational movements179 are present at any moment of the oxidation process (as proved by the experimental determination of the volume change or the continuous movements of artificial muscles), in order to be able to quantify them, we need to isolate them from either the electrons transfers, the counter-ion diffusion, or the solvent interchange we need electrochemical experiments in which the kinetics are under conformational relaxation control. Once the electrochemistry of these structural effects is quantified, we can again include the other components of the electrochemical reaction to obtain a complete description of electrochemical oxidation. 

The rate-limiting step is generally determined by either the surface reaction kinetics or by mass transport. 

Figure 2.8. Rate-limiting steps in a CVD reaction (a) surface reaction kinetics control, (b) diffusion control.

To summarize, the surface kinetics (or near surface kinetics) is the limiting step at lower temperature and diffusion is the rate limiting step at higher temperature. It is possible to switch from one rate-limiting step to the other by changing the temperature. This is illustrated in Fig. 2.9, where the Arrhenius plot (logarithm of the deposition rate vs. the reciprocal temperature) is shown for several reactions leading to the deposition of silicon,... 

In the A sector (lower right), the deposition is controlled by surface-reaction kinetics as the rate-limiting step. In the B sector (upper left), the deposition is controlled by the mass-transport process and the growth rate is related linearly to the partial pressure of the silicon reactant in the carrier gas. Transition from one rate-control regime to the other is not sharp, but involves a transition zone where both are significant. The presence of a maximum in the curves in Area B would indicate the onset of gas-phase precipitation, where the substrate has become starved and the deposition rate decreased. 

Where Br nucleophilically promotes the Br+/OTf- elimination to generate free Br2 and cyclohexene. This process requires that the rate of solvolysis of 4 be linearly dependent on [Br ]. However, control (ref. 15) kinetics experiments indicate that the rate constant for solvolysis of 4 in HOAc or MeOH are independent of Br" thus generation of free Br2 must occur after the rate limiting step. This nicely confirms the previous conclusion based upon the invariance of the n0a+10hV9h ratio on [Br]. 

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