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Kinetics films

In this section we will discuss the process in terms of reaction kinetics, film composition and film properties. Important to note is that the degree of utilization of WF6 under typical deposition conditions (ie. 50 nm/min and 2 seem WF6 per 6" wafer) is at least 50%. Thus the reactor is very likely to run in a depletion or feed controlled mode. As a result we expect the deposition rate to depend strongly on the WF6 total flow and be relatively insensitive to temperature variation. [Pg.182]

Yeung KL, Christiansen SC, Varma A. Palladium composite membranes by electroless plating technique relationships between plating kinetics, film micro structure and membrane performance. J Memb Sci. 1999 159(1-2) 107. [Pg.197]

Our library contains FRFs for four simple isothermal mechanisms Langmuir kinetics, film resistance model, micropore diffusion, and pore-surface model. For each mechanism, a short description with the model equations is given, together with the expressions for the first-order FRF Fx p(w), and two second-order FRFs, F2,pp(w, w) and F2,pp(w, —[Pg.293]

Applied potential Ohmic resistance Repassivatlon kinetics Film growth Active dissolution Valance... [Pg.170]

A number of friction studies have been carried out on organic polymers in recent years. Coefficients of friction are for the most part in the normal range, with values about as expected from Eq. XII-5. The detailed results show some serious complications, however. First, n is very dependent on load, as illustrated in Fig. XlI-5, for a copolymer of hexafluoroethylene and hexafluoropropylene [31], and evidently the area of contact is determined more by elastic than by plastic deformation. The difference between static and kinetic coefficients of friction was attributed to transfer of an oriented film of polymer to the steel rider during sliding and to low adhesion between this film and the polymer surface. Tetrafluoroethylene (Telfon) has a low coefficient of friction, around 0.1, and in a detailed study, this lower coefficient and other differences were attributed to the rather smooth molecular profile of the Teflon molecule [32]. [Pg.441]

The energetics and kinetics of film formation appear to be especially important when two or more solutes are present, since now the matter of monolayer penetration or complex formation enters the picture (see Section IV-7). Schul-man and co-workers [77, 78], in particular, noted that especially stable emulsions result when the adsorbed film of surfactant material forms strong penetration complexes with a species present in the oil phase. The stabilizing effect of such mixed films may lie in their slow desorption or elevated viscosity. The dynamic effects of surfactant transport have been investigated by Shah and coworkers [22] who show the correlation between micellar lifetime and droplet size. More stable micelles are unable to rapidly transport surfactant from the bulk to the surface, and hence they support emulsions containing larger droplets. [Pg.505]

This difference looks large enough to be diagnostic of the state of the adsorbed film. However, to be consistent with the kinetic derivation of the Langmuir equation, it was necessary to suppose that the site acted as a potential box and, furthermore, that a weak adsorption bond of ifi corresponding to 1 /tq was present. With these provisions we obtain... [Pg.613]

In general, it seems more reasonable to suppose that in chemisorption specific sites are involved and that therefore definite potential barriers to lateral motion should be present. The adsorption should therefore obey the statistical thermodynamics of a localized state. On the other hand, the kinetics of adsorption and of catalytic processes will depend greatly on the frequency and nature of such surface jumps as do occur. A film can be fairly mobile in this kinetic sense and yet not be expected to show any significant deviation from the configurational entropy of a localized state. [Pg.709]

Reiter G, Demirel A L and Graniok S 1994 From static to kinetic friction in confined liquid films Science 263 1741-4... [Pg.1747]

Finally, in 1985, the results of an extensive investigation in which adsorjDtion took place onto an aluminium oxide layer fonned on a film of aluminium deposited in vacuo onto a silicon wafer was published by Allara and Nuzzo 1127, 1281. Various carboxylic acids were dissolved in high-purity hexadecane and allowed to adsorb from this solution onto the prepared aluminium oxide surface. It was found that for chains with more than 12 carbon atoms, chains are nearly in a vertical orientation and are tightly packed. For shorter chains, however, no stable monolayers were found. The kinetic processes involved in layer fonnation can take up to several days. [Pg.2623]

Bibo A M and Peterson I R 1989 Disclination recombination kinetics in water-surface monolayers of 22-tricosenoic acid Thin Solid Films 178 81-92... [Pg.2631]

Poll Fl-U, Arzt M and Wickleder K-FI 1976 Reaction kinetics in the polymerization of thin films on the electrodes of a glow-discharge gap Eur. Polym. J 12 505-12... [Pg.2812]

Creighton J R and Bansenauer B A 1993 The surface chemistry and kinetics of GaAs atomic iayer epitaxy Thin Solid Films 225 17-25... [Pg.2944]

The following mechanisms in corrosion behavior have been affected by implantation and have been reviewed (119) (/) expansion of the passive range of potential, (2) enhancement of resistance to localized breakdown of passive film, (J) formation of amorphous surface alloy to eliminate grain boundaries and stabilize an amorphous passive film, (4) shift open circuit (corrosion) potential into passive range of potential, (5) reduce/eliminate attack at second-phase particles, and (6) inhibit cathodic kinetics. [Pg.398]


See other pages where Kinetics films is mentioned: [Pg.214]    [Pg.57]    [Pg.287]    [Pg.210]    [Pg.805]    [Pg.247]    [Pg.817]    [Pg.214]    [Pg.57]    [Pg.287]    [Pg.210]    [Pg.805]    [Pg.247]    [Pg.817]    [Pg.151]    [Pg.204]    [Pg.333]    [Pg.450]    [Pg.738]    [Pg.922]    [Pg.928]    [Pg.928]    [Pg.929]    [Pg.1868]    [Pg.2625]    [Pg.2716]    [Pg.2724]    [Pg.2748]    [Pg.2937]    [Pg.126]    [Pg.126]    [Pg.131]    [Pg.206]    [Pg.282]    [Pg.286]    [Pg.328]    [Pg.374]    [Pg.178]    [Pg.179]    [Pg.181]   
See also in sourсe #XX -- [ Pg.456 ]




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Kinetically Limited Film Thickness

Kinetics Regimes for Two-Film Model

Kinetics of Reactions in Films

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