Image etching

A rapidly increasing number of publications on polysilanes documents current interest in these polymers (JJ. Polysilanes are potentially applicable in microlithography as high resolution UV-resists (2J, imageable etch barriers ), or contrast enhancement layers (4). They have been successfully used as precursors to Si-C fibers (5J and ceramic reinforcing agents ((L). Polysilanes have also initiated polymerization of vinyl monomers (J ). Doping of polysilanes have increased their conductivity to the level of semiconductors (8). Very recently polysilanes were used as photoconductors (9) and non-linear optical materials (10b... 

Steel plate printing n. An intaglio type of printing using metal plates with the image etched or engraved below the surface. 

Figure 2-41 SEM image (etching 10 sec, 3% HF) of the microstructure of apatite-leucite glass-ceramic for dental restorations. Heat treatment of the glass powder at SSO C/I h and 1050°C/1 h. The apatite crystals measure approximately 0.1-0.5 and 1-2 pm in diameter. The leucite crystals measure approx. 2 pm.

This is because the external copper foil must be protected by the image mask during all the internal layer image, etch, strip, and oxide processing steps then the mask must be removed at a later point in the process so that the external... 

The ED polymers described in section 2.3 are not effective on their own as resists for primary imaging, etch-resists or any other application. The addition of other components to the resist is necessary for the formulation of workable products. Some typical resist additives for both negative- and positive-working photoresists are described in the following sections. Most of these additives are also incorporated into ED resists for other applications. 

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