Graphite Indium oxide

A membrane filter which can be dissolved in acetone, or a spectrochemically pure graphite filter which can be examined directly with a powder DC-arc technique, can provide passable results. After air has been drawn through a previously weighed filter, the membrane filter is dissolved in acetone, then centrifuged. The particulates are collected, dried, and weighed then a spectroscopic buffer is added composed of 1 part NaF and 1 part graphite powder, with 100 ppm indium oxide and 20,000 ppm tantalum oxide as internal standards. About 35 mg of the final mixture is placed in a graphite electrode and arced at 15 A for 60 sec in a controlled (90% At-10% O2) atmosphere. 

Manzoli A, Steffens C, Paschoalin RT, Correa AA, Alves WF, Leite FL, Herrmann PSP (2011) Low-cost gas sensors produced by the graphite line-patterning technique applied to monitoring banana ripeness. Sensors 11 6425-6434 Martin LP, Glass RS (2005) Hydrogen sensor based on YSZ electrolyte and tin doped indium oxide electrode. J Electrochem Soc 152 H43-H47... 

Additives used in finai products Fillers aluminum nitride, barium titanate, aluminum nitride, antimony trioxide, aramide fiber, attapulgite, carbon fiber, carbon nanofiber, carbon nanotubes, clay, glass fiber, graphite, molybdenum sulfide, montmorillonite, PTFE, silica, smectite, titanium oxide whisker Plasticizers diethylene glycol dibenzoate, dimethyl phthalate, triallyl phthalate, diethynyldi-phenyl methane, phenylethynyidiphenyl methane, 4-hydroxy-benzophenone Antistatics antimony-containing tin oxide, carbon black, carbon, nanotubes, indium oxide microspheres, polythiophene Release polyethylen wax, PTFE, silicone oil, zirconium chelate ... 

Substrates DME = dropping mercury electrode FTO = fluorine-doped tin oxide G = graphite GC = glassy carbon GrC = graphic carbon ITO = indium tin oxide-coated glass SC = single crystals SS = stainless steel TCO = transparent conducting oxide VC = vitrious carbon. Miscellaneous ECALE = electrochemical atomic layer epitaxy ED = electrodeposition ML = monolayer RT = room temperature SMD = sequential monolayer deposition V = vacuum. 

Substrates, Films are usually prepared on platinum or gold electrodes which are inert, but semiconducting materials including indium tin oxide, n-type polycrystalline silicon, gallium arsenide, cadmium sulphide and cadmium selenide, graphite [38, 59], and oxide covered metals [60] have also been used. In the majority of cases, the films are produced readily and the only serious limitations are the potential and the nucleophilic nature of the solution. 

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