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Glow discharges specific processes

FIC Ratio Model. The fluorine-to-carbon ratio (F/C) of the active species can be used (92) to explain the observed etch results (Figure 8). This model does not consider the specific chemistry occurring in a glow discharge but, rather, views the plasma as a ratio of fluorine species to carbon species that can react with a silicon surface. The generation or elimination of the active species by various processes or gas additions then modifies the initial F/C ratio of the inlet gas. [Pg.418]

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See also in sourсe #XX -- [ Pg.387 ]



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