Glow discharge process

Demonstration of GDMS feasibility and research into glow-discharge processes has been carried out almost exclusively using the combination of a glow-discharge ion source with a quadrupole mass spectrometer (GDQMS). The combination is inexpensive, readily available and suitable for such purposes. In addition, the quadru-... 

B. Chapman, Glow Discharge Processes—Sputtering and Plasma Etching. Wiley, New York, 1980. 

Chapman, B. N., "Glow Discharge Processes" Wiley New York, 1980. 

Chapman, B., Glow Discharge Processes, John Wiley Sons, NY (1980). 

The solution of the silver salts in the ionic liquids was almost transparent and colorless before the deposition experiment was started (Figure 10.10 (a)). After the onset of the glow discharge process the following observations were made (i) A homogeneous plasma burnt with a pale pink/blue optical emission between the... 

Chapman, B. Glow Discharge Processes Sputtering and Plasma Etching John Wiley Sons New York, 1980 Chapter 3. 

Plasma formation and the characteristics of glow discharge processes are subjects of extensive monographs [27,28],... 

Chapman, B, "Glow Discharge Processes Wiley-Interscience, New York, NY, 1980, p. 322. 

The sample sputtering rate, q (ng/pulse), occasionally referred to as the net sputtering rate — which recognizes the fact that the glow-discharge process involves redeposition effects — can be calculated from the following expression ... 

The process requires nearly three orders of magnitude higher flow rate of the carrier gas than typical flow rates of monomer or a mixture of monomer and a carrier gas in conventional glow discharge processes. The high consumption of carrier gas might necessitate the inclusion of carrier gas recovery system in an industrial scale operation. 

There has been a considerable amount of work done on thin film deposition of pure organic vapors by glow discharge polymerization in the past.(4) Hollahan and Rosier(5) have discussed the preparation of inorganic thin films by the glow discharge process, and their uses in the electronics industry. In most cases, the substrate is heated to 200°C or above to form these inorganic films. 

Chapman, B. Glow Discharge Processes. New York Wiley-lnterscience, 1980, p. 79 Botchway, G. Y., Venugopalan, M. Z. Physik. Chem., Neue Folge 120,103 (1980)... 

Grace JM, Freeman DR, Corts R and Kosel W. Scaleup of a nitrogen glow-discharge process for silver-poly(ethylene terephthalate) adhesion . Journal of Vacuum Science and Technology, 14,1996, pp ITl-nJU. 

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