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GaSb film deposition

Fig. 10 SEM images of GaSb films deposited at 350 °C (a) and 550 °C (b) usine t-BusGa-SbEts °... Fig. 10 SEM images of GaSb films deposited at 350 °C (a) and 550 °C (b) usine t-BusGa-SbEts °...
AFM studies clearly verified these results. The surface of the GaSb film deposited at 500 °C as shown in Figs. 16a and 16b is very homogeneous. At higher magnification, the cubic-shaped morphology of single crystallites can clearly be observed. [Pg.117]

C. Deposition of GaSb Films by Use of Single Source Precursors. 303... [Pg.225]

Zinc telluride, ZnTe, was deposited on quartz, silicon, InAs, and GaSb substrates using Zn[TeSi(SiMe3)3]2 at temperatures between 250 °C and 350 °C. On InAs (orientation not specified) a cubic ZnTe layer was obtained. Problems of stoichiometry are encountered at temperatures below 325 °C because decomposition of the precursor is incomplete, while at higher temperatures (above 350 °C) the deposited ZnTe decomposes into Zn (which evaporates) and involatile elemental tellurium which remains. The results with the analogous cadmium precursor (1.4 torr, 290 °C) indicate that the CdTe films may be of better stoichiometry than those of ZnTe, with XRD results indicating that on a Si substrate the hexagonal phase is predominantly... [Pg.1036]

CVD Deposition of Binary AlSb and GaSb Material Films -a Single-Source Approach... [Pg.101]

The forth chapter by S. Schulz also deals with single-source precursors and provides a study case on CVD Deposition of Binary AlSb and GaSb Material Films - a Single-Source Approach . The article summarises recent studies on the synthesis of M-Sb compounds and their potential application as precursors in OMCVD processes. General reaction pathways for the synthesis of Lewis-acid-base adducts R3M-ER3 and heterocycles of the type [R2MSbR2 h (M = Al, Ga) are described. The results of deposition studies are discussed. [Pg.223]

The electrochemical codeposition of GaSb from aqueous solution is difficult due to the large deposition potential difference between the two components. Paolucci et al. [181] formed GaSb thin films via the sequential electrodeposition of Sb and Ga films and a mild thermal annealing at 100 °C. Acid SbCla and alkaline GaOs " introduced as GaCla solutions was employed to minimize the hydrogen evolution and the formation of SbHs. A similar approach was adopted by Kozlov and Bicelli [182]. [Pg.1939]


See other pages where GaSb film deposition is mentioned: [Pg.101]    [Pg.116]    [Pg.101]    [Pg.116]    [Pg.307]    [Pg.102]    [Pg.111]    [Pg.116]    [Pg.118]    [Pg.119]    [Pg.13]    [Pg.21]    [Pg.299]    [Pg.303]    [Pg.114]    [Pg.117]    [Pg.117]    [Pg.213]    [Pg.262]    [Pg.270]   
See also in sourсe #XX -- [ Pg.116 ]




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Deposited films

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