Film/coating formation condensation

Sometimes it may become necessary to shut-in a gas well when the demand for gas is low. In such instances, the well is shut-in for an indefinite period, after which it is reopened and production is resumed. It often has been found that the production rate of gas from the reopened well is substantially less than it was before the well was shut-in. During production, the inner wall of the production tubing will be coated with a film of condensed freshwater because of the geothermal gradient. This water flows down when production is interrupted and can cause formation damage. This may occur because clays are normally saturated with brine water and not with freshwater. This swelling can be prevented with the injection of some additive, for example, sodium chloride, potassium chloride, calcium chloride, or an alcohol or a similar organic material [1853]. 

Well ordered mesoporous silicate films were prepared in supercritical carbon dioxide.[218] In the synthesis in aqueous or alcoholic solution, film morphology of preorganized surfactants on substrate cannot be fully prescribed before silica-framework formation, because structure evolution is coincident with precursor condensation. The rapid and efficient preparation of mesostructured metal oxides by the in situ condensation of metal oxides within preformed nonionic surfactants can be done in supercritical CCU- The synthesis procedure is as follows. A copolymer template is prepared by spin-coating from a solution containing a suitable acid catalyst. Upon drying and annealing to induce microphase separation and enhance order, the acid partitions into the hydrophilic domain of the template. The template is then exposed to a solution of metal alkoxide in humidified supercritical C02. The precursor diffuses into the template and condenses selectively within the acidic hydrophilic domain of the copolymer to form the incipient metal oxide network. The templates did not go into the C02 phase because their solubility is very low. The alcohol by-product of alkoxide condensation is extracted rapidly from the film into the C02 phase, which promotes rapid and extensive network condensation. Because the template and the metal oxide network form in discrete steps, it is possible to pattern the template via lithography or to orient the copolymer domains before the formation of the metal oxide network. 

Thin film dielectrics are usually deposited using chemical vapor deposition (CVD). A variation of CVD utilizing a plasma discharge is called plasma-enhanced CVD (PECVD) and is the standard in IC fabrication for the deposition of dielectric films. Plasma-enhanced CVD involves the formation of a solid film in a substrate surface from volatile precursors (vapor or gas) in a plasma discharge. The precursors are chosen to contain the constituent elements of the final film and chemical reactions in the gas phase are encouraged. They are condensed in a substrate that is heated or cooled. It will be shown later that porosity can be introduced in the PECVD films. Spin coating is another preparation technique and a popular choice... 

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