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F Trichlorosilane

Chlorine, Hydrogen( ), Sulfuric acid, 4047 f Chloroethylene, 0730 Ethyl acetate, 1618 Iron, Polystyrene, 4388 Lead(IV) oxide, Metals, 4834 Methylmercuiy perchlorate, 0433 Oxygen (Gas), Biological material, Ether, 4831 Potassium chlorate, Metal phosphinates, 4017 Potassium perchlorate, 4018 Sodium chlorate, Paper, Static electricity, 4039 f Trichlorosilane, 4136... [Pg.391]

Dodecachloropentasilane, 4192 Fluorosilane, 4292 Hexachlorodisilane, 4185 Iododisilane, 4538 Octachlorotrisilane, 4188 Poly(difluorosilylene), 4324 Tetrachlorosilane, 4167 f Tribromosilane, 0286 f Trichlorosilane, 4130 f Trifluorosilane, 4327... [Pg.2377]

Oxygen (Gas), Biological material, Ether, 4825 Potassium chlorate, Metal phosphinates, 4011 Potassium perchlorate, 4012 Sodium chlorate, Paper, Static electricity, 4033 f Trichlorosilane, 4130... [Pg.2589]

Fritzche, H., Hasserodt, U., and Korte, F., Reduktion tertiarer Phosphinoxyde zu tertaren Phosphinen mit Trichlorosilan, Berichte, 98, 171, 1965. [Pg.40]

Siemens A method for making ultra-pure silicon for semiconductors by thermally decomposing trichlorosilane. Invented in 1954 by F. Bischof at Siemens-Halska. In 1993 it was the major process used worldwide. [Pg.245]

Trichlorosilane-f-Amines. A general synthesis of allyltrimethylsilanes is illustrated by a synthesis of (E)-crotyltrimethylsilane (equation I).1... [Pg.322]

A trichlorosilane/tertiary amine mixture has been shown to reduce the carbonyl moiety of aromatic amides to give ASMAs. This constitutes an alternative to the reductive silylation described in Section III.B.2.f.194 This work has been reviewed195 and extended to aliphatic amides to give RSMA. [Pg.213]

For a monomolecular reaction, f is 1. Using a bifunctional modifier of the type R2SiX2, f varies in the range 1-2, depending on the ratio of vicinal to free silanols. For a completely bimolecular reaction, where 2 silanol molecules react with one molecule of modifier, f=2. Trimolecular reactions are excluded for steric reasons. In the specific case of trichlorosilane, the monomolecular reaction with silica occurs according to (L). The resulting surface groups will be called primary species furtheron. Secondary species can be formed either by a true bimolecular reaction (O) or by a secondary (consecutive) reaction (M). [Pg.271]

The experiments reported by Malkov and Kocovsky [12h] and by Sun [lla,b,e,f], indicate that the Lewis base catalyzed imine reduction with trichlorosilane is not affected by isomeric nonhomogeneity of the starting imines. Thus, for example, imines 9h-9j, which exist as 5 2 to 5 3 E/Z mixtures, were reduced to the corresponding amines with 94 97% ee (Table 4.5, entries 8 10). Appar ently, traces of HCl, naturally present in the moisture sensitive Cl3SiH, trigger an E/Z equilibration of imines 6-10, which is faster than the reduction (Scheme 4.5). [Pg.147]

Nickel catalysts exhibit lower catalytic activity than platinum and rhodium catalysts1,2 and, in many cases, phosphine-nickel complexes cause the disproportionation of chlorohydrosilanes giving rather complex results1. However, in some cases, the regioselectivity observed in the hydrosilylation of styrene with trichlorosilane catalyzed by nickel complexes is quite different from that achieved by platinum or rhodium catalysts. For instance, the a-adduct is exclusively formed by the catalysis of [Ni(CO) (f/5-C5H5)]254 (equation 12). [Pg.1486]

METIL TRICLOROSILANO (Spanish) (75-79-6) see methyl trichlorosilane. METIL VINIL CETONA (Spanish) (78-94-4) see methyl vinyl ketone. METOLACHLOR (51218-45-0) CijHjjClNOj Combustible liquid (flash point 374°F/190°C cc). Incompatible with strong acids, nitrates, oxidizers azo and diazo confounds. Moisture may cause slow decomposition. Thermal decomposition releases toxic nitrogen oxides. On small fires, use dry chemical powder (such as Purple-K-Powder), alcohol-resistant foam, or sand extinguishers. [Pg.743]

ETHYL TRICHLOROSILANE (115-21-9) Forms explosive mixture with air (flash point 64°F/18°C oc). Violent reaction with water, steam, alcohols, forming hydrogen chloride. Violent reaction with strong oxidizers, ammonia. Incompatible with alkalis, strong acids, aliphatic amines, alkanolamines, isocyanates, alkylene oxides, epichlorohydrin, halogenated compounds, nitrogen oxides. Corrodes common metals in the presence of moisture and produces flammable hydrogen. [Pg.547]

As indicated in Table 1, the disiloxanes in the feed stream are reduced in concentration during the distillation process. H. F. Stewart of Dow Coming first discovered the redistribution of SiH and SiOSi bonds at 70 - 120 °C [4]. This reaction in the distillation system results in the conversion of SiH-containing siloxanes to usable monomer and higher siloxanes. It has the net effect of reducing the overall SiH content in the DPR and the recovery of valuable trichlorosilane monomer. [Pg.128]


See other pages where F Trichlorosilane is mentioned: [Pg.187]    [Pg.2148]    [Pg.2069]    [Pg.187]    [Pg.2148]    [Pg.2069]    [Pg.154]    [Pg.161]    [Pg.187]    [Pg.455]    [Pg.264]    [Pg.1917]    [Pg.2377]    [Pg.39]    [Pg.282]    [Pg.44]    [Pg.154]    [Pg.4413]    [Pg.47]    [Pg.286]    [Pg.1247]    [Pg.243]    [Pg.37]    [Pg.42]    [Pg.297]    [Pg.426]    [Pg.741]    [Pg.1034]    [Pg.1079]    [Pg.70]    [Pg.368]    [Pg.494]    [Pg.808]    [Pg.1179]    [Pg.1231]    [Pg.4412]   


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