Etched patterned materials

Fluorescence Characterization of Ablated Polymeric Materials. In order to produce sharply etched patterns, the film was ablated with a photo-lithographically prepared mesh mask in the contact mode. The ablation was conducted with two laser shots with the laser fluence of 0.2 J/cm2. The decay curves of the ablated film was measured by a... 

The spacer double-patterning approach has some issues, the main one of which concerns placement accuracy of the features, which requires excellent dose and etch uniformity control. Equally problematic is the fact that the spacers may not stay in place at the proper location after the material to which they are attached (the HM pattern) is removed. Forming acceptable uniform spacer profiles that will yield uniform CDs is not a trivial exercise. In addition, the etch pattern transfer steps, often involving delicate removal of materials adjacent to the spacers, place unusually tight etch process tolerance on this technique, in order to have a successful outcome. 

The lithographic etching of highly stable materials remained a serious problem over the whole long tradition of etching. Patterning... 

Screen printing is a common method for producing standard copper-printed circuitry on metal-clad dielectric and other substrates. The etch-resist material is printed with a positive pattern (circuitry only) for copper etch-only boards or with a negative image (field only) when plated through-holes and metal resist are present. 

One idea to create nanostructured device layers is to use the natural processes of self-assembly to position organic and inorganic molecules from the bottom-up (Feynman, 1959). One particular approach that has received a considerable amount of attention is the use of block copolymers as a patterning material because of their inherent ability to form periodic nanostructures in the mesoscopic (10-50 nm) length scale, coupled to the facility of one of the polymers to be selectively degraded to create nanoporous thin films. These nanoporous films could act like a stencil mask for subsequent etching steps into the underlying substrate. This topic has attracted much attention and inspired several excellent reviews (Fasolka and... 

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