Electrochemical Codeposition of Sol-Gel-Based Hybrid and Composite Films

Electrochemical Codeposition of Sol-Gel-Based Hybrid and Composite Films 

The electrochemical deposition of sol-gel hybrid films was carried out in a mixture of at least two different sol-gel precursors. For example, Walcarius and coworkers [19-21,45] reported the co-electrodeposition of TEOS or methyltrie-thoxysilane (MTES) together with APTES or MPTMS for the electroanalysis of Cu(II) and Hg(II) in aqueous media. Liu and Mandler [46] reported the coelectrodeposition of TMOS with Ti(i-OPr)4, where they found that the obtained films had graded structure in composition. These works will be discussed in detail in this section. 

Sol-gel materials are also known as an excellent matrix for embedding other species due to their tunable physical properties (e.g., flexibility and transparency), high chemical stability, and mild operating conditions. Especially, electrochemical deposition of silane-based sol-gel Aims is usually carried out under mild acidic aqueous solutions at pH 3-6. This allows the co-electrodeposition of silane with nanoparticles [47-50], carbon nanotubes [51-53], metals [54-57], polymers [50,58], enzymes [52,53,59-65], bacteria [66,67], and more. Thus, most of the recent research worlcs also focus on the electrochemical deposition of sol-gel-based composite Aims, with the concern of improving the films performance in corrosion protection, electroanalysis, microextraction, and so on and further broadening the films applications. 

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