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Dissipation frequencies

B. Macroscopic Balance Equations and Lumped Dissipation Frequencies. 49... [Pg.19]

These energy-dependent dissipation frequencies are very important in characterizing the rapidity of the response of the electron component in different regions of the energy space to disturbances—for example, of the established steady state. These dissipation frequencies can be determined when the atomic data for the important electron collision processes and the gas density are known. [Pg.50]

Fig. 8. Lumped dissipation frequencies in collisions for neon and nitrogen. Fig. 8. Lumped dissipation frequencies in collisions for neon and nitrogen.
Since typical scattering experiments probe the system fluctuations in the frequency-wavenumber space, the Fourier transfonn v )is closer to measurements, which is in fact the imagmary (dissipative) part of the... [Pg.719]

In the electromagnetic spectrum, the energy absorbed makes up the difference between two allowed energy states in the absorber. In the loss spectrum the frequency absorbed closely matches the frequency of dissipative modes of molecular motion in the sample. [Pg.183]

The pulsed-plate column is typically fitted with hori2ontal perforated plates or sieve plates which occupy the entire cross section of the column. The total free area of the plate is about 20—25%. The columns ate generally operated at frequencies of 1.5 to 4 H2 with ampHtudes 0.63 to 2.5 cm. The energy dissipated by the pulsations increases both the turbulence and the interfacial areas and greatly improves the mass-transfer efficiency compared to that of an unpulsed column. Pulsed-plate columns in diameters of up to 1.0 m or mote ate widely used in the nuclear industry (139,140). [Pg.75]

Ferrites aHowing for operation at frequencies well above 1 MH2 have also become available, eg, 3F4 and 4F1 (Table 6). Other newer industrial power ferrites are the Siemens-Matsushita N-series (28,97) the TDK PC-series (28,100), and the Thomson B-series (28,103). While moving to higher frequencies, the ferrites have been optimized for different loss contributions, eg, hysteresis losses, eddy current losses, and resonance losses. Loss levels are specified at 100°C because ambient temperature in power appHcations is about 60°C plus an increase caused by internal heat dissipation of about 40°C. [Pg.197]

In air, PTFE has a damage threshold of 200—700 Gy (2 x 10 — 7 x 10 rad) and retains 50% of initial tensile strength after a dose of 10" Gy (1 Mrad), 40% of initial tensile strength after a dose of 10 Gy (10 lad), and ultimate elongation of 100% or more for doses up to 2—5 kGy (2 X 10 — 5 X 10 rad). During irradiation, resistivity decreases, whereas the dielectric constant and the dissipation factor increase. After irradiation, these properties tend to return to their preexposure values. Dielectric properties at high frequency are less sensitive to radiation than are properties at low frequency. Radiation has veryHtde effect on dielectric strength (86). [Pg.352]

The dissipation factor (the ratio of the energy dissipated to the energy stored per cycle) is affected by the frequency, temperature, crystallinity, and void content of the fabricated stmcture. At certain temperatures and frequencies, the crystalline and amorphous regions become resonant. Because of the molecular vibrations, appHed electrical energy is lost by internal friction within the polymer which results in an increase in the dissipation factor. The dissipation factor peaks for these resins correspond to well-defined transitions, but the magnitude of the variation is minor as compared to other polymers. The low temperature transition at —97° C causes the only meaningful dissipation factor peak. The dissipation factor has a maximum of 10 —10 Hz at RT at high crystallinity (93%) the peak at 10 —10 Hz is absent. [Pg.353]

The dielectric permittivity as a function of frequency may show resonance behavior in the case of gas molecules as studied in microwave spectroscopy (25) or more likely relaxation phenomena in soUds associated with the dissipative processes of polarization of molecules, be they nonpolar, dipolar, etc. There are exceptional circumstances of ferromagnetic resonance, electron magnetic resonance, or nmr. In most microwave treatments, the power dissipation or absorption process is described phenomenologically by equation 5, whatever the detailed molecular processes. [Pg.338]

To minimize electrical losses, especially at high frequencies, a low dissipation factor is required. High volume resistance provides good insulation to prevent... [Pg.525]

Electrical Properties. Polysulfones offer excellent electrical insulative capabiUties and other electrical properties as can be seen from the data in Table 7. The resins exhibit low dielectric constants and dissipation factors even in the GH2 (microwave) frequency range. This performance is retained over a wide temperature range and has permitted appHcations such as printed wiring board substrates, electronic connectors, lighting sockets, business machine components, and automotive fuse housings, to name a few. The desirable electrical properties along with the inherent flame retardancy of polysulfones make these polymers prime candidates in many high temperature electrical and electronic appHcations. [Pg.467]

Another resonant frequency instmment is the TA Instmments dynamic mechanical analy2er (DMA). A bar-like specimen is clamped between two pivoted arms and sinusoidally oscillated at its resonant frequency with an ampHtude selected by the operator. An amount of energy equal to that dissipated by the specimen is added on each cycle to maintain a constant ampHtude. The flexural modulus, E is calculated from the resonant frequency, and the makeup energy represents a damping function, which can be related to the loss modulus, E". A newer version of this instmment, the TA Instmments 983 DMA, can also make measurements at fixed frequencies as weU as creep and stress—relaxation measurements. [Pg.199]

The optoelectronic properties of the i -Si H films depend on many deposition parameters such as the pressure of the gas, flow rate, substrate temperature, power dissipation in the plasma, excitation frequency, anode—cathode distance, gas composition, and electrode configuration. Deposition conditions that are generally employed to produce device-quahty hydrogenated amorphous Si (i -SiH) are as follows gas composition = 100% SiH flow rate is high, --- dO cm pressure is low, 26—80 Pa (200—600 mtorr) deposition temperature = 250° C radio-frequency power is low, <25 mW/cm and the anode—cathode distance is 1-4 cm. [Pg.359]

If all the PES coordinates are split off in this way, the original multidimensional problem reduces to that of one-dimensional tunneling in the effective barrier (1.10) of a particle which is coupled to the heat bath. This problem is known as the dissipative tunneling problem, which has been intensively studied for the past 15 years, primarily in connection with tunneling phenomena in solid state physics [Caldeira and Leggett 1983]. Interaction with the heat bath leads to the friction force that acts on the particle moving in the one-dimensional potential (1.10), and, as a consequence, a> is replaced by the Kramers frequency [Kramers 1940] defined by... [Pg.9]

In realistic systems, the separation of the modes according to their frequencies and subsequent reduction to one dimension is often impossible with the above-described methods. In this case an accurate multidimensional analysis is needed. Another case in which a multidimensional study is required and which obviously cannot be accounted for within the dissipative tunneling model is that of complex PES with several saddle points and therefore with several MEPs and tunneling paths. [Pg.11]

Thus far we have discussed the direct mechanism of dissipation, when the reaction coordinate is coupled directly to the continuous spectrum of the bath degrees of freedom. For chemical reactions this situation is rather rare, since low-frequency acoustic phonon modes have much larger wavelengths than the size of the reaction complex, and so they cannot cause a considerable relative displacement of the reactants. The direct mechanism may play an essential role in long-distance electron transfer in dielectric media, when the reorganization energy is created by displacement of equilibrium positions of low-frequency polarization phonons. Another cause of friction may be anharmonicity of solids which leads to multiphonon processes. In particular, the Raman processes may provide small energy losses. [Pg.20]


See other pages where Dissipation frequencies is mentioned: [Pg.50]    [Pg.50]    [Pg.51]    [Pg.55]    [Pg.50]    [Pg.50]    [Pg.51]    [Pg.55]    [Pg.1385]    [Pg.1712]    [Pg.2747]    [Pg.3048]    [Pg.88]    [Pg.177]    [Pg.345]    [Pg.190]    [Pg.353]    [Pg.361]    [Pg.367]    [Pg.375]    [Pg.417]    [Pg.314]    [Pg.320]    [Pg.152]    [Pg.268]    [Pg.353]    [Pg.354]    [Pg.354]    [Pg.316]    [Pg.86]    [Pg.257]    [Pg.191]    [Pg.133]    [Pg.261]    [Pg.23]   
See also in sourсe #XX -- [ Pg.49 , Pg.50 ]




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