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Diffusion limit model

An important question concerning energy trapping is whether its kinetics are limited substantially by (a) exciton diffusion from the antenna to RCs or (b) electron transfer reactions which occur within the RC itself. The former is known as the diffusion limited model while the latter is trap limited. For many years PSII was considered to be diffusion limited, due mainly to the extensive kinetic modelling studies of Butler and coworkers [232,233] in which this hypothesis was assumed. More recently this point of view has been strongly contested by Holzwarth and coworkers [230,234,235] who have convincingly analyzed the main open RC PSII fluorescence decay components (200-300 ps, 500-600 ps for PSII with outer plus inner antenna) in terms of exciton dynamics within a system of first order rate processes. A similar analysis has also been presented to explain the two PSII photovoltage rise components (300 ps, 500 ps)... [Pg.173]

The mechanism of particle growth in the course of hydrolysis and condensation of Ti, Zr, and Ta alkoxides has been frequently discussed. Nevertheless, the discussion so far remains open. Ring suggested a diffusion-limited model for growth of particles [484, 1357] other authors, however, assume a growth mechanism limited by reaction on the surface of the growing species [1228, 708, 477]. [Pg.119]

The Diffusion Limit Model. In this model 34, 41 5) internal motion does not exist such that diffusion is the only heat transport mechanism. This represents the slowest internal heat transfer limit and is relevant for more viscous fuels or during the initial period when insuflBcient amount of internal motion has been generated. [Pg.10]

In general, results from this model show (50) that the dominant vaporizing species participate approximately sequentially in order of their relative volatihties. The transition between any adjacent pair begins when the concentration of the less volatile species exceeds that of the more volatile one. The droplet temperature increases monotonically, with most of the increase occurring during the transition period, which can be quite abrupt for compounds with large volatihty differentials. These vaporization characteristics differ qualitatively from those of the diffusion limit model. [Pg.18]

Alternatively, the thin-skin model, which assumes an infinite diffusion resistance with only a thin layer on the droplet surface being heated and evaporated, can be used. This second assumption is more appropriate for cases in which the droplet reaches its boiling temperature immediately after the start of the evaporation process. All the other approaches (such as the diffusion-limited model), which are recommended in the case of mulhcompo-nent droplets, require some form of spahal discretization inside the droplet, resulting in much higher computational costs. To close the set of equahons, it is necessary to describe the evolution of the droplet temperature Tp as discussed in Section 5.2.3. For example, upon including the effect of evaporation on the heat flux for the rapid-mixing model, the particle-enthalpy balance yields... [Pg.159]

Figure 5.28. The diffusion limited model for growth of a wetting layer, (a) The true situation a wetting layer exists in local equilibrium with the depleted concentration (f>i. Growth of the wetting layer is driven by diffusion of material from the bulk, (b) A schematic box model for the same situation. Figure 5.28. The diffusion limited model for growth of a wetting layer, (a) The true situation a wetting layer exists in local equilibrium with the depleted concentration (f>i. Growth of the wetting layer is driven by diffusion of material from the bulk, (b) A schematic box model for the same situation.
From a lag-time experiment, the diffusion coefficient D of carrier 7 could be obtained independently (Equation 21). D is 9.4 x 10 m s which deviates from the diffusion coefficient D as obtained by applying the diffusion limited model (D = 3.7 X 10 m s" ). Apparently, the diffusion limited model can not be applied to determine the transport parameters of carrier 7. Hence, kinetics must influence the transport mechanism that lowers the transport rate as an additional resistance. [Pg.35]

Figure 9. (a) Waveguide mode patterns of a thin alumina film before and after functionalization with APTE in I mM methanol solution, (b) In-situ kinetics of APTE adsorption was followed using the right-most guided mode in (a). Open diamonds are data, and the solid line is fitted with a 2-step diffusion limited model (See page 2 of color inserts.)... [Pg.387]


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See also in sourсe #XX -- [ Pg.10 , Pg.15 ]




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