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Diffraction spot size

Greenhough, T. J., Helliwell, J. R., and Rule, S. A. Oscillation camera data processing. 3. General diffraction spot size, shape and energy profile formalism for polychromatic diffraction experiments with monochromatized synchrotron X-radiation from a singly bent triangular monochromator. J. Appl. Cryst. 16, 242-250 (1983). [Pg.273]

The crystal to IP distances for 0.5 A and 0.3 A are, of course, increased. This is advantageous because of the inverse square law effect in reducing the background under the diffraction spot. However, a crystal to film distance of, say, 0.5 m with a 1 mrad divergence beam would lead to a sizeable increase in the diffraction spot size (i.e. by 0.5mm). On an undulator, however, beam divergences are intrinsically —0.1 mrad and so the spot size over a 0.5 m distance would only increase by 0.05 mm due to this effect (table 6.4). Mosaic spreads of specimens also need to be narrow but —0.1 mrad is a quite reasonable expectation for these samples (Helliwell (1988) and Colapietro, Helliwell, Spagna and Thompson, unpublished, see figure 2.8(c)). [Pg.273]

Islands occur particularly with adsorbates that aggregate into two-dimensional assemblies on a substrate, leaving bare substrate patches exposed between these islands. Diffraction spots, especially fractional-order spots if the adsorbate fonns a superlattice within these islands, acquire a width that depends inversely on tire average island diameter. If the islands are systematically anisotropic in size, with a long dimension primarily in one surface direction, the diffraction spots are also anisotropic, with a small width in that direction. Knowing the island size and shape gives valuable infonnation regarding the mechanisms of phase transitions, which in turn pemiit one to leam about the adsorbate-adsorbate interactions. [Pg.1769]

Focusing Laser Light. One of the most important properties of laser radiation is the abiHty to coUect all of the radiation using a simple lens and to focus it to a spot. It is not possible to focus the laser beam down to a mathematical point there is always a minimum spot size, set by the physical phenomenon of diffraction. A convenient equation is... [Pg.3]

The ratio F/d is the F number of the lens. For F numbers much less than unity, spherical aberration precludes reaching the ultimate diffraction-limited spot size. Therefore a practical limit for the minimum spot size obtainable is approximately the wavelength of the light. Commonly this is expressed as the statement that laser light may be focused to a spot with dimensions equal to its wavelength. [Pg.3]

Spot size. The size of the LGS is a critical issue, since it dehnes the saturation effects of the laser and the power needed to reach a given system performance, and also the quality of the wavefront sensing. There is an optimum diameter of the projector, because, if the diameter is too small, the beam will be spread out by diffraction and if it is too large it will be distorted due to atmospheric turbulence. The optimum diameter is about 3ro, thus existing systems use projection telescopes with diameters in the range of 30-50 cm. [Pg.221]

Depending on the size and packing (space group) of the asymmetric unit in the crystal and the resolution available, many tens of thousands of diffraction spots must be recorded to determine a structure. [Pg.282]

More recently, the reconstruction of the clean W(100) surface has also been studied by He diffraction. These studies reveal a complex behavior during the transition. Only at temperatures below 240 K sharp diffraction spots centered at the (1/2,1/2) positions are observed. In the temperature range between 400 K and 240 K broad superstructure spots are observed which progressively shift to the (1/2,1/2) position upon cooling. Lapujoulade and Salanon explain this behavior in the framework of a domain wall model reconstructed domains of various sizes are separated by dense domain walls, which disappear continuously upon cooling. [Pg.267]

A small spot size for electron diffraction is used for three reasons i) to have a relatively small variation of thickness since most crystals are wedge shaped, ii) to reduce the amount of unwanted information like that of the matrix around a small precipitate and iii) to have a little variation in the crystal orientation. The latter reason is quite important which one can appreciate by moving the electron beam in nanodiffiaction mode over the specimen although the crystal is well aligned according to the selected area diffraction, fluctuations in orientation over 1 to 2° in all directions occur, even for areas which are very close to each other (10-50 nm). Such orientation variations should be considered as normal rather than an exception. [Pg.357]

Such a pinhole density test was performed on the AZ/PMMA two-layer deep-UV PCM system (26). The result is shown in Table IX where a pinhole density of 8 and 6 per cm was obtained for the capped (A) and uncapped (B) systems. Because only three wafers were used for each test, the result should be taken only qualitatively and the numerical difference between 6 and 8 pinholes/cm should be taken as being indicative of measurement fluctuations only. It should not be attributed to the use of different developers or O2 plasma because in the subsequent tests of batches C and D in which the DUV exposure was omitted, the numbers were 0 and 1 pinhole/cm with the capped system giving the smaller pinhole density. The low pinhole density in batch E in which the AZ development step was omitted suggests that the pinholes arise during the development of the AZ layer. Presumably, a small portion of the AZ base resin molecules were not linked up with the photoactive compound and therefore still exhibited their intrinsic high solubility in the AZ developer. After development, these high solubility spots became pinholes. These pinholes are apparently larger than the diffraction - limited sizes so that they can be transferred into the PMMA film by deep-UV exposure. [Pg.327]

If the beam size hitting the crystal is increased from 80 pirn X 80 pirn to 160 i.m X 160 pirn, then if the crystal is still at least as large as the beam and if the beam is then focused at the detector such that the diffraction spots are still contained in no more than four pixels, the signal-to-noise is further improved to a final value of 10.9, this time simply by increasing the signal rather than decreasing the noise. [Pg.250]

The dimension of the mirror 2w, which is the front end of the cantilever, should be a fraction of its length /. It imposes a diffraction limit on the spot size D of the laser beam at the detector, which is at a distance L from the mirror ... [Pg.322]

Fig. 16.1. He scattering pattern of reconstructed Au(lll). Schematic representation of the full diffraction pattern. The crosses indicate the diffraction peak locations expected for the unreconstructed surface. The center spots D and K are off by AG=0.054 A, which is larger than the bulk value 2.515 A, indicating a contraction in this direction. The spot sizes [except the (112) groups] are proportional to the intensity. (Reproduced from Harten et al., 1985, with permission.)... Fig. 16.1. He scattering pattern of reconstructed Au(lll). Schematic representation of the full diffraction pattern. The crosses indicate the diffraction peak locations expected for the unreconstructed surface. The center spots D and K are off by AG=0.054 A, which is larger than the bulk value 2.515 A, indicating a contraction in this direction. The spot sizes [except the (112) groups] are proportional to the intensity. (Reproduced from Harten et al., 1985, with permission.)...

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See also in sourсe #XX -- [ Pg.283 , Pg.492 , Pg.493 , Pg.495 ]




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