Density semiconductors

Improved resin flow control around closely spaced high-density semiconductor assemblies... 

Bit density (semiconductor) The number of bits (information storage) per unit area on a silicon chip (or magnetic tape). 

Figure Bl.22.4. Differential IR absorption spectra from a metal-oxide silicon field-effect transistor (MOSFET) as a fiinction of gate voltage (or inversion layer density, n, which is the parameter reported in the figure). Clear peaks are seen in these spectra for the 0-1, 0-2 and 0-3 inter-electric-field subband transitions that develop for charge carriers when confined to a narrow (<100 A) region near the oxide-semiconductor interface. The inset shows a schematic representation of the attenuated total reflection (ATR) arrangement used in these experiments. These data provide an example of the use of ATR IR spectroscopy for the probing of electronic states in semiconductor surfaces [44]-...

The deposition of amoriDhous hydrogenated silicon (a-Si H) from a silane plasma doped witli diborane (B2 Hg) or phosphine (PH ) to produce p-type or n-type silicon is important in tlie semiconductor industry. The plasma process produces films witli a much lower defect density in comparison witli deposition by sputtering or evaporation. 

There are many ways of increasing tlie equilibrium carrier population of a semiconductor. Most often tliis is done by generating electron-hole pairs as, for instance, in tlie process of absorjition of a photon witli h E. Under reasonable levels of illumination and doping, tlie generation of electron-hole pairs affects primarily the minority carrier density. However, tlie excess population of minority carriers is not stable it gradually disappears tlirough a variety of recombination processes in which an electron in tlie CB fills a hole in a VB. The excess energy E is released as a photon or phonons. The foniier case corresponds to a radiative recombination process, tlie latter to a non-radiative one. The radiative processes only rarely involve direct recombination across tlie gap. Usually, tliis type of process is assisted by shallow defects (impurities). Non-radiative recombination involves a defect-related deep level at which a carrier is trapped first, and a second transition is needed to complete tlie process. 

The light emitted in the spontaneous recombination process can leave tire semiconductor, be absorbed or cause additional transitions by stimulating electrons in tire CB to make a transition to tire VB. In tliis stimulated recombination process anotlier photon is emitted. The rate of stimulated emission is governed by a detailed balance between absorjDtion, and spontaneous and stimulated emission rates. Stimulated emission occurs when tire probability of a photon causing a transition of an electron from tire CB to VB witli tire emission of anotlier photon is greater tlian that for tire upward transition of an electron from tire VB to tire CB upon absorjDtion of tire photon. These rates are commonly described in tenns of Einstein s H and 5 coefficients [8, 43]. For semiconductors, tliere is a simple condition describing tire carrier density necessary for stimulated emission, or lasing. This carrier density is known as... 

A logical consequence of this trend is a quantum w ell laser in which tire active region is reduced furtlier, to less tlian 10 nm. The 2D carrier confinement in tire wells (fonned by tire CB and VB discontinuities) changes many basic semiconductor parameters, in particular tire density of states in tire CB and VB, which is greatly reduced in quantum well lasers. This makes it easier to achieve population inversion and results in a significant reduction in tire tlireshold carrier density. Indeed, quantum well lasers are characterized by tlireshold current densities lower tlian 100 A cm . ... 

The first semiconductor lasers, fabricated from gallium arsenide material, were formed from a simple junction (called a homojunction because the composition of the material was the same on each side of the junction) between the type and n-ty e materials. Those devices required high electrical current density, which produced damage ia the region of the junction so that the lasers were short-Hved. To reduce this problem, a heterojunction stmcture was developed. This junction is formed by growing a number of layers of different composition epitaxially. This is shown ia Figure 12. There are a number of layers of material having different composition is this ternary alloy system, which may be denoted Al Ga his notation, x is a composition... 

For a weU-designed, weU-made HgCdTe photoconductoi detector (76,77), g-r noise is dominant and may be expressed in terms of a minority carrier densityp and majority carrier density n. Semiconductor noise analysis for the HgCdTe photoconductor yields,... 

Plasma Types. Eigure 1 (7—9) indicates the various types of plasmas according to their electron density and electron temperature. The colder or low electron energy regions contain cold plasmas such as interstellar and interplanetary space the earth s ionosphere, of which the aurora boreaUs would be a visible type alkaU-vapor plasmas some flames and condensed-state plasmas, including semiconductors (qv). 

Impurity-produced plasmas in semiconductors do not have to be compensated by charges of the opposite sign. These plasmas can be produced by introduction of either electron donors or electron scavengers, ie, hole producers, into semiconductor lattices. Thek densities range from a lower limit set by the abihty to produce pure crystals particles/cm ) to values in excess of 10 particles/cm. Plasmas in semiconductors generally are dilute, so that... 

In an intrinsic semiconductor, charge conservation gives n = p = where is the intrinsic carrier concentration as shown in Table 1. Ai, and are the effective densities of states per unit volume for the conduction and valence bands. In terms of these densities of states, n andp are given in equations 4 and... 

The electron current density J has units of A/cm and in a semiconductor results from drift and diffusion. In the absence of concentration gradients, equation 7 reduces to Ohm s law, = nqp E = [Pg.346]

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