Copolymer schematic representation

Figure 3.8. Schematic representation of the polystyrene domain structure in styrene-butadiene-styrene triblock copolymers. (After Holden, Bishop and Legge )...

Fig. 10. Schematic representation of a random copolymer at the interface between two incompatible homopolymers. Incompatibility increases in the order (a), (b), (e).

Figure 9 The schematical representation of dispersion polymerization process, (a) initially homogeneous dispersion medium (b) particle formation and stabilizer adsorption onto the nucleated macroradicals (c) capturing of radicals generated in the continuous medium by the forming particles and monomer diffusion to the forming particles (d) polymerization within the monomer swollen latex particles, (e) latex particle stabilized by steric stabilizer and graft copolymer molecules (f) list of symbols.

Figure 2 Schematic representation of the domain structure of styrene-butadiene-styrene block copolymer.

Figure 16 1. Schematic representation of copolymers with well-defined conjugation length A is a conjugated chromophorc, B is an interruption unit (a) alternating copolymer (b) polymer with slereo-chcmically defined non-coplanar linkages.

Fig. 1. Schematic representation of two-phase domain morphology for segmented copolymers 51 158)...

FIGURE 13.4 Schematic representation of maleic anhydride graft-rich clusters in maleated ethylene-propylene copolymers (EPMs). 

FIGURE 13.11 Schematic representation of ionomers prepared by neutralization of maleated ethylene-propylene copolymer (EPM) with zinc acetate. 

Fig. 20 (A) Structure of polyHMPA copolymer and (B) schematic representation of cross-linked polyHMPA copolymer.

Figure 12. Oversimplified schematic representation of the morphology of HBIB and HIBI block copolymers in the low and high butadiene concentration ranges.

Fig. 32 Schematic representation of molecular structure and morphology observed in PS-fo-PB-fc-PS linear and star-block copolymers. Oblique lines between blocks for LN2 and ST2 indicate tapered transition of dissimilar blocks. From [102], Copyright 2003 Wiley...

Fig. 61 a Schematic representation of phase diagram of blend of PS-rich (a) with Pi-rich (/S) PS-fc-PI block copolymer in parameter space of a, and T. Expected morphologies of blend specimen are also sketched at b low and c high temperatures. Note phase diagram is effective only for American Chemical Society... 

Finally, we have designed and synthesized a series of block copolymer surfactants for C02 applications. It was anticipated that these materials would self-assemble in a C02 continuous phase to form micelles with a C02-phobic core and a C02-philic corona. For example, fluorocarbon-hydrocarbon block copolymers of PFOA and PS were synthesized utilizing controlled free radical methods [104]. Small angle neutron scattering studies have demonstrated that block copolymers of this type do indeed self-assemble in solution to form multimolecular micelles [117]. Figure 5 depicts a schematic representation of the micelles formed by these amphiphilic diblock copolymers in C02. Another block copolymer which has proven useful in the stabilization of colloidal particles is the siloxane based stabilizer PS-fr-PDMS [118,119]. Chemical... 

Simplified schematic representation of the structure of SBS block copolymers... 

Fig 1 Schematic representation of a globule of a binary copolymer with a fuzzy profile of monomeric units... 

Fig. i Schematic representation of chain conformation in micelles from a linear PEO-PBO diblock copolymers, b linear PEO-PBO-PEO triblock copolymers, c linear PBO-PEO-PBO triblock copolymers and d cyclic PEO-PBO diblock copolymers... 

Fig. 2 Schematic representation of a starlike (a) and a crew-cut (b) micelle. Important structural parameters (Rc and Rm) of block copolymer micelles are indicated in (b)...

Fig. 6 AFM topographic images (a-d, i, j) and cross sections (e, f, k, I) of a miktoarm PS-P2VP star copolymer adsorbed on mica from chloroform (a-c, e), from THF (d, f) and from acidic water (HC1, pH = 2) in salt free (i, k) and in the presence of 1 mM Na3P04 (j, I). Schematic representation of the solution conformations and conformations in adsorbed state of the PS-P2VP in chloroform (g), THF (h), in water at pH = 2 before (n) and after adsorption (m) respectively (PS arms in red, P2VP ones in blue). Reprinted with permission from [116]. Copyright (2003) American Chemical Society...

Fig. 18 Schematical representation of different types of micelles formed by ABC triblock copolymers. Core-shell-corona micelles with insoluble core and shell (a), core-shell-corona micelles with radially compartmentalized corona (b), and Janus micelles with laterally compartmentalized corona (c)...

Fig. 19 TEM image of toroidal micelles from a PAA-PMA-PS triblock copolymer (A). This sample was cast from a solution with 0.1 wt% PAA99-PMA73-PS66 triblock copolymer, a THF water volume ratio of 1 2, and an amine acid molar ratio of 0.5 1 by addition of 2,2-(ethylenedioxy)diethylamine. The cast film was negatively stained with uranyl acetate. A schematical representation of theses micelles is also shown (B). Reprinted with permission from [279], Copyright (2004) American Association for the Advancement of Science...

Fig. 2 Schematic representation of control of block copolymer thin film orientations by adjusting polymer-substrate interactions neutral interfaces...

Fig. 3 Schematic representation of control over block copolymer thin film orientation by applying an electric field to orient PS-6-PMMA cylinders perpendicular to the substrate (taken from [43])...

Fig. 6 Schematic representation of controlling the block copolymer thin film orientations by using top-down lithography-defined chemically patterned heterogeneous sin-face...

Fig. 8 Schematic representation of block copolymer nanolithography process, a Schematic cross-sectional view of a nanolithography template consisting of a uniform mono-layer of PB spherical microdomains on silicon nitride. PB wets the air and substrate interfaces, b Schematic of the processing flow when an ozonated copolymer film is used as a positive resist, which produces holes in silicon nitride, c Schematic of the processing flow when an osmium-stained copolymer film is used as a negative resist, which produces dots in silicon nitride, (taken from [44])...

Fig. 9 Schematic representation of three approaches to generate nanoporous and meso-porous materials with block copolymers, a Block copolymer micelle templating for mesoporous inorganic materials. Block copolymer micelles form a hexagonal array. Silicate species then occupy the spaces between the cylinders. The final removal of micelle template leaves hollow cylinders, b Block copolymer matrix for nanoporous materials. Block copolymers form hexagonal cylinder phase in bulk or thin film state. Subsequent crosslinking fixes the matrix hollow channels are generated by removing the minor phase, c Rod-coil block copolymer for microporous materials. Solution-cast micellar films consisted of multilayers of hexagonally ordered arrays of spherical holes. (Adapted from [33])...

Fig. 10 Schematic representation of the nanoreplication processes from block copolymers, a Growth of high-density nanowires from a nanoporous block copolymer thin film. An asymmetric PS-fc-PMMA diblock copolymer was aligned to form vertical PMMA cylinders under an electric field. After removal of the PMMA minor component, a nanoporous film is formed. By electrodeposition, an array of nanowires can be replicated in the porous template (adapted from [43]). b Hexagonally packed array of aluminum caps generated from rod-coil microporous structures. Deposition of aluminum was achieved on the photooxidized area of the rod-coil honeycomb structure (Taken from [35])...

Figure 14 Schematic representation of the microphase separation of block copolymers. The left graph shows atomic-scale details of the phase separation at intermediate temperatures, and the right graph shows a lamellar phase formed by block copolymers at low temperatures. The block copolymers have solid-like properties normal to the lamellae, because of a well-defined periodicity. In the other two directions, the system is isotropic and has fluid-like characteristics. From reference 54.

Scheme 8 Schematic representation of the synthesis of statistical copolymers of 2-hydroxypropyl acrylate (mixture of isomers) and W-acryloyl morpholine...

NMP is as successful as RAFT polymerization for the construction of block copolymers. A small library of block copolymers comprised of poly(styrene) (PSt) and poly(ferf-butyl acrylate) (FYBA) was designed and the schematic representation of the reaction is depicted in Scheme 10 [49]. Prior to the block copolymerization, the optimization reactions for the homopolymerization of St and f-BA were performed as discussed in this chapter (e.g., see Sect. 2.1.2). Based on these results,... 

Scheme 12 Schematic representation of the synthetic procedure that was applied for the preparation of three triblock copolymers with the same first and second blocks...

Scheme 13 Schematic representation of the synthetic route towards a library of PStm-[Ru]-PEO block copolymers, where m and n denote the degree of polymerization (DP) of PSt and PEO, respectively, and where -[Ru]- represents the bis(terpyridine) mthenium complex...

Figure 6 Schematic representation of the problems that can be encountered during the synthesis of a zwitterionic diblock copolymer by aqueous ATRP. I represents the initiator fragment and represents the block junction...

FIGURE 16.13 Schematic representation of separation of a block copolymer poly(A)-block-poly(B) from its parent homopolymers poly(A) and poly(B). The elnent promotes free SEC elntion of all distinct constitnents of mixtnre. The LC LCD procednre with two local barriers is applied. Poly(A) is not adsorptive and it is not retained within colnmn by any component of mobile phase and barrier(s). At least one component of barrier(s) promotes adsorption of both the homopolymer poly(B) and the block copolymer that contains poly(B) blocks, (a) Sitnation in the moment of sample introdnction Barrier 1 has been injected as first. It is more efficient and decelerates elntion of block copolymer. After certain time delay, barrier 2 has been introdnced. It exhibits decreased blocking (adsorption promoting) efficacy. Barrier 2 allows the breakthrongh and the SEC elution of block copolymer but it hinders fast elution of more adsorptive homopolymer poly(B). The time delay 1 between sample and barrier 1 determines retention volume of block copolymer while the time delay 2 between sample and barrier 2 controls retention volume of homopolymer poly(B). (b) Situation after about 20 percent of total elution time. The non retained polymer poly(X) elutes as first. It is followed with the block copolymer, later with the adsorptive homopolymer poly(B), and finally with the non retained low-molar-mass or oligomeric admixture. Notice that the peak position has an opposite sign compared to retention time or retention volume Tr. 

Figure 11.27 Schematic representation of the hexagonal columnar strucmre of an ABA trihlock copolymer with a G1 dendton and the body-centered cubic strucmre of an ABA triblock with a G2 dendron.

Fig. 26. Polymerization of acrylonitrile by polylmethyl methacrylate) mastication. Schematic representation of block copolymer formation and...

FIGURE 2. Schematic representations of a siloxane-polystyrene AB-type (left) and ABA-type (right) copolymer at a polystyrene surface... 

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