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Conduction band offset

At the interface of the nitride (Ef, = 5.3 eV) and the a-Si H the conduction and valence band line up. This results in band offsets. These offsets have been determined experimentally the conduction band offset is 2.2 eV, and the valence band offset 1.2 eV [620]. At the interface a small electron accumulation layer is present under zero gate voltage, due to the presence of interface states. As a result, band bending occurs. The voltage at which the bands are flat (the flat-band voltage Vfb) is slightly negative. [Pg.178]

On-state insulator reliability due to much smaller conduction band offset of SiC to SiO compared with that of silicon [6-8] ... [Pg.157]

Material Dielectric Constant Critical Field (MV/cm) Operating Field (MV/cm) (MV/cm) Conduction Band Offset to Si (eV) ... [Pg.160]

Calculated conduction band offsets of b b-k oxides to Si reported by Robertson [16]. Source [11]. [Pg.160]

A serious potential problem related to the use of high-k gate dielectrics in SiC power MOSEETs can be encountered due to the much smaller (sometimes-negative) conduction band offsets between SiC and high-k metal oxides compared with silicon dioxide (see Table 5.1). Time-dependent dielectric breakdown (TDDB) and hot... [Pg.161]

Fig. 1.11. Energy-level alignment between ZnO and (Zn,Mg)0 as determined by optical spectroscopy [100]. The energy-level alignment agrees with a recent indirect determination using photoelectron spectroscopy [105]. The difference of the band gaps is almost fully accomplished by a conduction band offset... Fig. 1.11. Energy-level alignment between ZnO and (Zn,Mg)0 as determined by optical spectroscopy [100]. The energy-level alignment agrees with a recent indirect determination using photoelectron spectroscopy [105]. The difference of the band gaps is almost fully accomplished by a conduction band offset...
Fig. 4.1. Example energy band diagrams for a semiconductor/metal contact and and a semiconductor p/n-heterocontact. The Schottky barrier height for electrons B,n is given by the energy difference of the conduction band minimum Ecb and the Fermi energy Ey. The valence and conduction band offsets A/ An and AEcb are given by the discontinuities in the valence band maximum Eyb and the conduction band minimum, respectively... Fig. 4.1. Example energy band diagrams for a semiconductor/metal contact and and a semiconductor p/n-heterocontact. The Schottky barrier height for electrons B,n is given by the energy difference of the conduction band minimum Ecb and the Fermi energy Ey. The valence and conduction band offsets A/ An and AEcb are given by the discontinuities in the valence band maximum Eyb and the conduction band minimum, respectively...
The electron affinity of a semiconductor relates the vacuum level to the conduction band minimum at the surface. An informative way to view the electron affinity is as the conduction band offset between the semiconductor and vacuum. The band structure of the vacuum is simply the parabolic free electron bands, and the minimum energy (or vacuum level) refers to an electron at rest. For most materials, an electron at the bottom of the conduction band is bound to the material by a potential barrier of several volts. This barrier is the electron affinity and is defined as a positive electron affinity. In some instances, the vacuum level can actually align below the conduction band minimum. This means that an electron at the minimum of the conduction band would not see a surface barrier and could be freely emitted into vacuum. This situation is termed a negative electron affinity. [Pg.98]

Efii and E are the band gaps of the two materials ( qi being the larger) and AE. and AEy are the band offsets. For the nitride overlayers, the sum on the right hand side agrees with the silicon nitride band gap of 5.3 eV within about 0.2 eV, which is as accurate as can be expected for this type of measurement. The conduction band offset is nearly twice that of the valence band and the interface is illustrated in Fig. 9.18. [Pg.343]

Figure 3. Room temperature CER spectra for (a) 7,5-nm thick Gao92lU().o8No.o25Aso..jSbo.o75/C3aAs QW and (b) 7.5-nm thick Ga,i.68lno,32No. Figure 3. Room temperature CER spectra for (a) 7,5-nm thick Gao92lU().o8No.o25Aso..jSbo.o75/C3aAs QW and (b) 7.5-nm thick Ga,i.68lno,32No.<i25Aso.%5Sbo.oi/GaAs QW Right panel - the analysis of the conduction band offset for these QWs. In this case, it is the conduction band offset for unstrained materials, see details in Ref [21],...
The electronic structures of the cooperative J-T phases of all three group IVB transition metal oxides are always referenced to ideal structures, cubic rutile for Ti02, and cubic Cap2 for HfOi and ZrOa. This approach parallels the seminal electronic structure calculations of the Robertson group at the University of Cambridge in which conduction band offset energies between Si and these TM oxides have been addressed in the context of replacement or alternative dielectrics for Si02 in advanced Si microelectronic devices [1,10]. [Pg.770]

This approach was appUed to heterostructured seeded nanorods, both for CdSe-CdS (type I) and for ZnSe-CdS QD/QR core-shell nanocrystals. The former system was studied extensively, using a variety of optical spectroscopy methods the data acquired suggested a charge separation, where the hole is located in the QlSe core [positioned close to one end of the nanorod (NR)j and the electron extends over the CdS shell [84]. This picture is consistent with a small value of the conduction band offset, typically Ac<0.2eV, extracted from the bulk regime. However, a direct measurement of the band offsets and the consequent charge distribution in such nanocrystals is of major interest... [Pg.386]


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