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Chemical resistance also radiation

Halar ECTFE (ethylenechlorotrifluoroethylene) This material is an alternating copolymer of ethylene and chlorotrifluroethylene. This fluoropolymer withstands continuous exposure to extreme temperatures and maintains excellent mechanical properties across this entire range (from cryogenic temperatures to 180°C). It has excellent electrical properties and chemical resistance, having no known solvent at 121°C. It is also nonbuming and radiation-resistant. Its ease of processing affords a wide range of products. [Pg.496]

Diamond like films are amorphous, smooth and lightweight. The ability to produce very thin (2-6 nm) and smooth films together with low atomic number makes these films an ideal material for use as protective coatings on x-ray mirrors. Also, these films are scratch/chemical resistant and block ultraviolet radiation. These properties taken together can revolutionize the spectacle and goggle industry. These properties... [Pg.360]

Inorganic membranes of good radiation and chemical resistance available Separation of dissolved salts from particulate and colloidal material Inorganic membranes available with good chemical and radiation stability can also operate at elevated temperatures Pressure <1 MPa... [Pg.873]

The measurement of many other polymer characteristics are of practical importance. Among these are various electrical properties such as volume resistivity, surface resistivity, dielectric constant, arc resistance, etc. Also, solubility properties, polymer-polymer compatibility [22], chemical resistance, resistance to radiations, etc. are measured on polymers (see e.g. [1]). [Pg.30]

In bacteria, mutation is an important mechanism by which resistance to antibiotics and other antimicrobial chemicals is achieved, although the receipt of entirely new genes directly from other bacteria is also clinically very important. Spontaneous mutation rates (rates not influenced by mutagenic chemicals or ionizing radiation) vary substantially depending on the gene and the organism in question, but rates of 10-5-10-7 are typical. These values... [Pg.21]

PVDF components are used extensively in the high purity semiconductor market (low extractible values), pulp and paper industry (chemically resistant to halogens and acids), nuclear waste processing (radiation and hot acid applications), and the general chemical processing industry (chemical and temperature applications). Fluoropolymers have also met specifications for food and pharmaceutical processing industries. [Pg.2384]

The results clearly demonstrate that aromatic hydrocarbons are markedly less resistant to radiation in the vapor phase than in the liquid G values for their disappearance in the vapor phase (6.3 to 10) are, in fact, not much smaller than those of comparable saturated hydrocarbons. In aromatic liquids neutralization of the ions produced by radiolysis is rapid the excited states, produced either directly or by ion recombination, degrade mostly to the parent hydrocarbon (6). Those chemical reactions which excited species, or radicals derived from them, undergo in the liquid phase should also occur in the vapor and might be enhanced by... [Pg.141]

It is also possible to build into the chemical systems other properties that are desired in the treated wood. Fire retardancy, chemical resistance, or resistance to ultraviolet radiation can be built into the bonding or polymerizing systems. Thus, serious problems can be solved while stability, strength, and integrity are improved. [Pg.430]

It is also important to consider that the color of a material affects its absorption of infrared radiation when the material is exposed to sun radiation. Figure 3.23 shows that the darker the color the more extensive the absorption and the higher the temperature. The temperature of products has many further implications on its performance, such as degradation, flexibility, change of shape, mechanical strength, creep, chemical resistance, etc. [Pg.57]

The chemical resistance of PEEK is shown in Table 6.3. PEEK exhibits a remarkable chemical resistance, comparative to fluoropolymers. PEEK is approved by the FDA. PEEK undergoes crosslinking by irradiation in vacuum under stress. The tensile properties of PEEK sheets after UV radiation show a tendency to embrittlement. This is caused not only by crosslinking but also by the orientation of molecular chains resulting from the temperature rise of the specimens. Furthermore, the tensile stress applied during exposure accelerates molecular scission and disturbs the crosslinking. ... [Pg.215]


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See also in sourсe #XX -- [ Pg.115 , Pg.118 ]

See also in sourсe #XX -- [ Pg.115 , Pg.118 ]




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Chemical resistance

Chemical resistance (also

Radiation resist

Radiation resistance

Radiation-resistant

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