Carbon-nitrogen films mechanical properties

Popov, C., Zambov, L. M., Plass, M. R, and Kulisch, W., Optical, Electrical and Mechanical Properties of Nitrogen-rich Carbon Nitride Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition," Thin Solid Films, Vol. 377-378,2000, pp. 156-162. 

Research on plasma-deposited a-C(N) H films has been frequently included in the general discussion of carbon nitride solids [2, 3]. However, the presence of hydrogen in its composition, and the complexity of the deposition process, which introduces the nitrogen species in the already intricate hydrocarbon plasma-deposition mechanism, make a-C(N) H films deserve special consideration. This is the aim of the present work to review and to discuss the main results on the growth, structure, and properties of plasma-deposited a-C(N) H films. As this subject is closely related to a-C H films, a summary of the main aspects relative to the plasma deposition of a-C H films, their structure, and the relationship between the main process parameters governing film structure and properties is presented... 

H. Nakazawa, A. Sudoh, M. Suemitsu, K. Yasui, T. ltoh,T. Endoh, Y. Narita, M. Mashita, Mechanical and tribological properties of boron, nitrogen-coincorporated diamond-like carbon films prepared by reactive radio-frequency magnetron sputtering., Diamond and Related Materials, vol. 19, pp. 503-506, 2010. 

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