Aperture plate

Fig. 39. Schematic showing the basics of cell projection. The desired beam shape is selected by steering the electron beam through the appropriate pattern in the aperture plate. By using a rectangular aperture the system can operate like a conventional direct-write e-beam tool, so any shape of pattern can be...

Figure 5. An isometric view of the new injection system, showing the dipole magnets B1 and B2, the electrostatic deflectors D1-D4, and the aperture plate A A. The positions of the electrostatic quadrupoles Q1 and Q2 are indicated also. The principal rays for beams of two different isotopes in the deflected up position are indicated by the solid lines, with the undeflected rays shown as...

The detector disclosed in US-A-S006711 refers to an HgCdTe multi-element detector array formed on a sapphire substrate. The elements have individual electrodes and a common electrode. When the electrodes are formed by a lift-off process, the maximum thickness of the metal layer forming the electrodes is limited due to the operational characteristics of the lift-off process. This results in a non-negligible resistance of the common electrode, which gives the device a low sensitivity. To reduce the resistance of the common electrode, an auxiliaiy electrode is formed on an aperture plate such that when the aperture plate is assembled onto the detector, the auxiliary electrode is pressed onto the common electrode. 

Detector elements 11 are formed on a ceramic substrate 1. Each detector element includes a photosensitive zone 9, an output terminal 4 and a common terminal S. The detector elements are arranged in an array protruding from a common metal line 3, which is connected to a terminal pad 6. The terminal electrodes and the common metal line are formed on a comb-like patterned photo-conductive layer 2. An aperture plate 7 of silicon or ZnS having apertures 8 formed therein by an anisotropic etching method is prepared. The purpose of the aperture plate is to restrict the field of view of the photosensitive zones. An auxiliary electrode 30 is formed on the aperture plate. When the aperture plate is assembled with the substrate using an adhesive, the auxiliary electrode is pressed against the common metal line and the common terminal, which together reduce the electrical resistance. 

V direciions loscan an aperture plate located on the focal plane of the monochromator. The plate contains as many as 3(X) photo-etched slits. The time required to move from one slit to another is typically I s. The instrument can be operated in a slew-scan mode. This instrument can also be converted to a multichannel poly-chromalor by mounting several small photomultiplier lubes behind appropriate slits in the aperture plate. 

The principle of maskless ion projection lithography is illustrated in Fig. 15.10. A hroad ion beam is used to illuminate a programmable aperture plate with thousands of apertures of micrometer-scale dimensions, generating up to 4000 beams. In the vicinity of the apertures are tiny deflection plates, each of which can be individually controlled with the aid of integrated CMOS electronics. The slightly deflected beams are blocked at the stopping plate, and the nondeflected... 

Aperture Plate Blanking Plate Deflecting Electrodes... 

Trommel screens are rotating, inclined cylinders, the walls of which are generally made of punched plate. Stone is fed to the upper end of the cylinder and is transported by the rotation of the cylinder over the apertures. Plates with progressively larger apertures may be fitted to produce a number of size fractions. Over-... 

Figure 121 illustrates a sequential echelle spectrometer. Light from the entrance slit is directed by the collimating mirror to the echelle grating, and the diffracted beam is then reflected to the prism lense (order-sorter) and focusing lense. A two-dimensional spectrum is formed in the focal plane of the system. An aperture plate, which contains preset apertures, is mounted at the focal plane. Slits and mirrors are placed at appropriate positions on a... 

When Qc or Q2 is operated as a linear ion trap, an rf drive voltage of 1 MHz is applied. An auxiliary ac potential is applied in quadrupolar fashion to the rod arrays of either Qc or Q2 so as to excite ions at secular frequencies. Ions are trapped radially in the linear ion trap Qc by the rf potential, and are confined axially within the rod array by dc potentials applied to the aperture plates, IQ2 and IQ3. Thus, a linear ion trap resembles a bathtub having a parabolic cross-section and near vertical ends. Ions enter the linear ion trap close to the zero-field centerline of the device and encounter a series of momentum-dissipating collisions with collision gas. 

Figure 2 - Schematic view of the cooled static drift tube primary ion source (F, filament IR, ionisation region SI, source gas inlet) SQ, primary ion selector quadrupole L1 and L2, focusing lenses DT, drift tube FP, front plate RP, rear plate E1 and E2 aperture plate, AQ, analyser quadrupole CM, channel multiplier ...

HPLC was used as the reference method and the tablets were found to vary between 96 and 102% of labeled strength. To determine the accuracy and precision of the method, one tablet was analyzed ten times with sample removal and replacement between scans. The NIR-determined value was within 0.5 mg of the HPLC-determined value, indicating the accuracy of the method. Tablet placement on the spectrometer played an important role in the precision of the method, even with the use of the aperture plate. 

Figure 3.3 Pressure drop versus total volume rate for various slit plate mixer models LH2, LH25, and LH1000 with the configuration of mixing plates (MPs) and aperture plates (APs).

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