Vapor-Deposited Aluminum

In most cases the phosphor layer is then subjected to an aluminum vapor deposition process. This increases the brightness by reflection of the backward-radiating luminescence and inhibits charge buildup in the phosphor layer. 

For other coatings, aluminum vapor deposition (2-15 g/m ) was shown by Shin et al. (1992) to be more protective, thickness for thickness, on galvan-nealed substrates than on zinc-iron electroplating. At 2 g/m aluminum, salt spray corrosion resistance was five times better more meaningful tests were not conducted. The aluminum also resisted limited cycling to 500°C. 

Metallization layers are generally deposited either by CVD or by physical vapor deposition methods such as evaporation (qv) or sputtering. In recent years sputter deposition has become the predominant technique for aluminum metallization. Energetic ions are used to bombard a target such as soHd aluminum to release atoms that subsequentiy condense on the desired substrate surface. The quaUty of the deposited layers depends on the cleanliness and efficiency of the vacuum systems used in the process. The mass deposited per unit area can be calculated using the cosine law of deposition ... 

Boron filaments are formed by the chemical vapor deposition of boron trichloride on tungsten wire. High performance reinforcing boron fibers are available from 10—20 mm in diameter. These are used mainly in epoxy resins and aluminum and titanium. Commercial uses include golf club shafts, tennis and squash racquets, and fishing rods. The primary use is in the aerospace industry. 

There are several vacuum processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD), sputtering, and anodic vacuum arc deposition. Materials other than metals, ie, tetraethylorthosiHcate, silane, and titanium aluminum nitride, can also be appHed. 

Nickel, K., Riedel, R., and Petzow, G., Thermodynamic and Experimental Study of High-Purity Aluminum Nitride Formation from Aluminum Chloride by Chemical Vapor Deposition, /. Amer. Ceram. Soc., 72(10) 1804-1810 (1989)... 

The interconnecting holes are narrow and deep (at times less than 0.25 im wide and up to 2 im or more in depth) and, after a diffusion-barrier layer is applied, it must be filled completely with a high-conductivity metal (usually aluminum or tungsten) to provide the low-resi stance plug for inter-layer connections. Typically, CVD provides better step coverage and conformity than sputtering and other physical-vapor deposition processes. 

In recent years the coordination of N-, P-, or O-donor Lewis bases to aluminum and gallium trihydrides has been studied extensively (27). Interest in these complexes stems in part from their applications in a wide variety of areas, for example chemical vapor deposition technology (28) and organic synthesis (29). However, the corresponding carbene complexes of the heavier group 13 trihydrides have only been... 

The phenomenon of organic EL was first demonstrated using a small-molecule fluorescent emitter in a vapor-deposited OLED device. The Kodak group first used metal oxinoid materials such as the octahedral complex aluminum tris-8-hydroxyquinoline (Alq3) (discussed above as an ETM) as the fluorescent green emitter in their pioneering work on OLED architectures [167],... 

Recently, the efficacy of LDHs as catalyst precursors for the synthesis of carbon nanotubes via catalytic chemical vapor deposition of acetylene has been reported by Duan et al. [72]. Nanometer-sized cobalt particles were prepared by calcination and subsequent reduction of a single LDH precursor containing cobalt(II) and aluminum ions homogeneously dispersed at the atomic level. Multi-walled carbon nanotubes with uniform diameters were obtained. 

Depending on purposes, a plastic film under the vapor-deposited C is dissolved away with a solvent. By this method, a very thin C support-film of smaller than lOnm in thickness can be made easily. An aluminum (Al) support-film can be made similarly, by vapor-deposition of Al onto a plastic film put on a grid and then by dissolving away the plastic film. The reflection rings from the Al support-film can be used as an internal reference to calibrate the camera length of SAED pattern, and this support film does give no amorphous halo. When an ultra-thin C support-film (less than 5nm in thickness) is desired, a microgrid (MG see Section 3.1.2) should be used on which an ultra-thin film made by indirect vapor-deposition of C has been put in advance. 

Hooper A, Fisher GL, Konstadinidis K, Jung D, Nguyen H, Opila R, Collins RW, Winograd N, Allara DL (1999) Chemical effects of methyl and methyl ester groups on the nucleation and growth of vapor-deposited aluminum films. J Am Chem Soc 121 8052-8064... 

Dannetun P, Boman M, Stafstrom S, Salaneck WR, Lazzaroni R, Fredriksson C, Bredas JL, Zamboni R, Taliani C (1993) The chemical and electronic structure of the interface between aluminum and polythiophene semiconductors. J Chem Phys 99(l) 664-672 Ahn H, Whitten JE (2003) Vapor-deposition of aluminum on thiophene-terminated self-assembled monolayers on gold. J Phys Chem B 107(27) 6565-6572 Fisher GL, Flooper A, Opila RL, Jung DR, Allara DL, Winograd N (1999) The interaction between vapor-deposited A1 atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. J Electron Spectrosc Relat Phenom 98-99 139-148... 

Fisher GL, Walker AV, Hooper AE, Tighe TB, Bahnck KB, Skriba HT, Reinard MD, Haynie BC, Opila RL, Winograd N, Allara DL (2002) Bond insertion, complexation, and penetration pathways of vapor-deposited aluminum atoms with HO- and CHsO-terminated organic monolayers. J Am Chem Soc 124(19) 5528-5541... 

Lu P, Demirkan K, Opila RL, Walker AV (2008) Room-temperature chemical vapor deposition of aluminum and aluminum oxides on alkanethiolate self-assembled monolayers. J Phys Chem C 112(6) 2091-2098... 

---