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Adatoms diffusion coefficients

Figure 4.14. Rhodium adatom diffusion coefficients (Nl ) on different Rh single-crystal planes as a function of reciprocal temperature [97]. Figure 4.14. Rhodium adatom diffusion coefficients (Nl ) on different Rh single-crystal planes as a function of reciprocal temperature [97].
However, the increased number of adatoms at high temperatures can influence their mobility, since clusters of LJ atoms were observed to have smaller diffusion coefficients than isolated atoms. Figure 5 shows the average diffusion coeflScients of adatoms, also as a function of here the deviation from Arrheinus behavior is in the other direction. [Pg.222]

The rate of mass transport is the product of these two factors, the density of atoms and the diffusion coefficient per atom, as shown in Fig. 6. Over a large temperature interval up to the mass transport coefficient is almost perfectly Arrhenius in nature. The enhanced adatom concentrations at high temperatures are offset by the lower mobility of the interacting atoms. Thus, surface roughening does not appear to cause anomalies in the... [Pg.222]

The first qualitative observation of vacancy-induced motion of embedded atoms was published in 1997 by Flores et al. [20], Using STM, an unusual, low mobility of embedded Mn atoms in Cu(0 0 1) was observed. Flores et al. argued that this could only be consistent with a vacancy-mediated diffusion mechanism. Upper and lower limits for the jump rate were established in the low-coverage limit and reasonable agreement was obtained between the experimentally observed diffusion coefficient and a theoretical estimate based on vacancy-mediated diffusion. That same year it was proposed that the diffusion of vacancies is the dominant mechanism in the decay of adatom islands on Cu(00 1) [36], which was also backed up by ab initio calculations [37]. After that, studies were performed on the vacancy-mediated diffusion of embedded In atoms [21-23] and Pd atoms [24] in the same surface. The deployment of a high-speed variable temperature STM in the case of embedded In and an atom-tracker STM in the case of Pd, allowed for a detailed quantitative investigation of the vacancy-mediated diffusion process by examining in detail both the jump frequency as well as the displacement statistics. Experimental details of both setups have been published elsewhere [34,35]. A review of the quantitative results from these studies is presented in the next subsections. [Pg.353]

Importantly, any process that results in lateral coverage gradients of either the additive or metal adatom will be countered by surface diffusion. Such surface transport is known to be strongly influenced by both potential and electrolyte composition through associated impact on the structure and composition of the surface. For example, anions are known to lead to substantial enhancement of metal adatom transport with diffusion coefficients ranging from 2 1CT16 up to 8 10-13 cm2 s 1 [137, 138],... [Pg.119]

Adatoms moving along the substrate surface under an STM tip introduce an additional current noise [2, 3]. Random jiunps of adatoms under an STM tip and the current dependence on time, I(t), caused by these jumps, are shown schematically in Fig. 1. The random function 7(r) found experimentally can be used to obtain information about the diffusion process. It is the task of the theory to connect I(t) with the parameters of the system under investigation, in particular with the diffusion coefficients of adatoms and their density. [Pg.46]

Recent single-crystal studies reveal the surface-structure sensitivity and anisotropy of self-diffusion (70, 71]. Depending on the structure of the crystal face, diffusion coefficients may vary by orders of magnitude. This is shown for rhodium adatom diffusion on various rhodium crystal faces in Figure 4.14. Diffusion rates parallel to steps are greater than diffusion rates perpendicular to them. [Pg.344]

Here AE represents the energy difference between the saddle point aid initial adsorption site and correspords to the activation barrier for adatom jumps. P is then compared to a random number between 1 and 0 [53Metl]. If P is greater than the random number, then the adatoms jnnqrs into the new site. Each time an adatom is selected, the time is increased by an amoimt At=i/N, where 1/t represents the attenqrt fiequency of hops, and N denotes the number of adatoms in the ensemble [91Loml]. The surface diffusion coefficient is then calculated from Eq. 9. [Pg.467]

FIGURE 1.5 Dependence of the electron diffusion coefficient D(E) on the intensity of the external electric field E for CNT (10,0) ideal - solid line and hydrogen adatom - dashed line, x-axis is a dimensionless quantity of the external electric field E (unit corresponds to 4.7x10 V/m), they-axis is a dimensionless diffusion coefficient D(E) (unit corresponds to 3.5xl(EA/m). [Pg.9]

When adding the adsorbed hydrogen atoms the electron diffusion coefficient, as well as the conductivity is reduced by 0.05% (Fig. 1.5). This behavior of the diffusion coefficient in an external electric field is observed for different concentrations of hydrogen adatoms (Fig. 1.6) and semiconductor CNTs with different diameters by adding 100 adatoms (Fig. 1.7). [Pg.10]

The method for theoretical calcrdation of the semiconducting zigzag CNT transport properties with adsorbed hydrogen atoms developed. Analytical expressions for the conductivity and the electron diffusion coefficient in zigzag CNT with hydrogen adatoms in the presence of an electric field. [Pg.11]

Hydrogen dissolution in metals (group V metals, palladium, Pd-alloys) is a dissociative process leading to the formation of surface hydrogen adatoms that diffuses across the membrane with a diffusion coefficient Dh. Assuming that hydrogen behaves as an ideal gas, its chemical potential is ... [Pg.701]

A method was developed for determining the surface diffusion coefficient and activation energy of Ge adatoms on (001). That is, Ge self-assembled quantum dots which were grown on a relaxed SiGe buffer-layer nucleated preferentially over a network of buried 60° dislocations. The surface sites over the buried dislocations acted as sinks for Ge adatoms. The pre-exponential term in the diffusion constant could also be determined by using Pick s first law, and the observation that the total incident flux of Ge adatoms which impinged on the denuded zones equaled the average rate of volume increase of self-assembled quantum dots over dislocations. The diffusion of Ge adatoms on Si (001) could be described by ... [Pg.86]

A method was developed for determining the surface diffusion coefficient and activation energy of Ge adatoms on (001). That is, Ge self-assembled quantum dots which were grown on a relaxed SiGe buffer-layer nucleated preferentially over a network of buried 60° dislocations. The diffusion of Ge adatoms on Si (001) could be described by ... [Pg.87]

RHEED oscillations are also particularly useful in monitoring the type of growth mode of the depositing material. Four different film growth modes are generally identified mainly related to the diffusion coefficient of the adatoms on the surface, the dimensions of the substrate terraces, and the lattice parameter mismatch between the substrate and the film ... [Pg.158]

The contribution of surface diffusion to electrolytic crystal growth can only be considerable if the concentration in the solution is low and the concentration of adatoms is high. Diffusion coefficients in liquid solutions will be larger than on surfaces, a reason for the... [Pg.64]

As a first basic example, we consider the diffusion of a Cu adatom on a solid Cu (001) surface, as simulated by tfMC [47]. The Cu-Cu interaction was described by the standard embedded atom method potential. The diffusion coefficient was determined directly from the calculated trajectories, and the rate constant was calculated from the Arrhenius equation. The tfMC simulations were carried out using A = 0.10 A, corresponding to an average MC time step between 7.8 and 10 fs, in the temperature range 550-900 K, and compared with both MD simulations as well as with the literature. The dynamics of the adatom diffusion process as determined from the tfMC algorithm are shown in Fig. 2. It was found that tfMC correctiy reproduces the different diffusion mechanisms as observed in the MD simulations. Also, the activation barrier as determined from... [Pg.273]


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