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Wafer slicing

Single-Crystal Silicon. Silicon is still the dominant material in photovoltaic. It has good efficiency, which is 25% in theory and 15% in actual practice. Silicon photovoltaic devices are made from wafers sliced from single crystal silicon ingots, produced in part by CVD (see Ch. 8, Sec. 5.1). However, silicon wafers are still costly, their size is limited, and they cannot be sliced to thicknesses less than 150 im. One crystalline silicon wafer yields only one solar cell, which has an output of only one watt. This means that such cells will always be expensive and can only be used where their high efficiency is essential and cost is not a major factor such as in a spacecraft applications. [Pg.395]

Includes Crystal growing, grinding to diameter, wafer slicing polishing... [Pg.323]

Metal bonding can be separated into two different types sintered metal bonding and electroplating. In ultraprecision grinding the sintered metal bond system is used for thin wheels which cut brittle materials, for example, silicon wafers (slicing/dicing) (Anderson et al. 2001) or for micro-pencil grinding tools (Aurich et al. 2009). [Pg.1278]

X-ray diffraction, and are epoxy bonded to a graphite carrier in preparation for wafer slicing. [Pg.652]

The flow of electricity, and hence its function, of a MOSFET is controlled by the extent of the electrical field formed within the substrate materials. Silicon wafers sliced from cylindrical single crystals of silicon undei o dozens of production steps before they are suitable for use as substrates for ICs. [Pg.1060]

Nonpolar CaN Quasi-Wafers Sliced from Bulk GaN Crystals Crown by High-Pressure Solution and HVPE Methods... [Pg.53]

I 3 Nonpolar GaN Quasi-Wafers Sliced from Bulk CaN Crystals... [Pg.56]

Bulk SiC substrates made by the Acheson method or the Lely method have been used as the substrates for growth of a-SiC. Recently, SiC wafers sliced from an SiC ingot grown by the modified Lely method have been used. Usually, ((X)01) Si or ((X)01) C surfaces are used. Here, homoepitaxial growth of SiC by CVD using an SiH4-C3Hg-H2 reaction gas system is illustrated... [Pg.442]

The next step is the hydrogen reduction of the trichlorosilane (Reaction 2 above). The end product is a poly crystalline silicon rod up to 200 mm in diameter and several meters in length. The resulting EGS material is extremely pure with less than 2 ppm of carbon and only a few ppb of boron and residual donors. The Czochralski pulling technique is used to prepare large single crystals of silicon, which are subsequently sliced into wafers for use in electronic devices.1 1... [Pg.223]

The wafer is scribed and sliced into row bars as shown in Figure 20.6. The row bars are bonded to tooling bars that hold them during mechanical processing. [Pg.339]

Crystal boules are sliced into wafers on which microelectronic circuits and power semiconductor devices are fabricated. An important use of the wafers is for infrared dectors for space, defense, and environmental applications. [Pg.1474]

Ingots of EGS are evaluated for resistivity, crystal perfection, and mechanical and physical properties, such as size and mass. The ingots are sliced into wafers using at least 10 machining and polishing procedures. These wafers are sliced sequentially from the ingot, and evaluated for the correct surface orientation, thickness, taper, and bow. As a final procedure, the wafers are chemically cleaned to remove surface contaminants prior to use. [Pg.346]

To appreciate the rapid development of process technology, the progression of the IC industry must be considered first. (For summaries of the historical development of this field, see references 1 and 2.) A central theme in the IC industry is the simultaneous fabrication of hundreds of monolithic ICs (or chips) on a wafer (or slice) of silicon (or other material such as gallium arsenide), which is typically 100-150 mm in diameter and 0.75 mm thick. In silicon technology, chip areas generally range from a few square millimeters to over 100 mm2. A large number (often more than 100) of individual process steps, which are precisely controlled and carefully sequenced, are required for the fabrication. [Pg.14]


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See also in sourсe #XX -- [ Pg.473 ]




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