Vacuum technology applications

Applications to nuclear physics and astrophysics will be dealt in Chapter 15 and Chapter 16. For the applications in vacuum technology see Section 1.6.4. 

HucknaU, D.J. Vacuum Technology and Applications 1st ed. Butterworth-Heinemann Oxford, 1991. 

It should be noted that in general that the conductance in a vacuum component is not a constant value which is independent of prevailing vacuum levels, but rather depends strongly on the nature of the flow (continuum or molecular flow see below) and thus on pressure. When using conductance indices in vacuum technology calculations, therefore, it is always necessary to pay attention to the fact that only the conductance values applicable to a certain pressure regime may be applied in that regime. 

Vacuum technology puts great demands on the functioning and reliability of the valves, which are often needed in large numbers in a plant. The demands are fulfilled only if correct shut-off devices are installed for each application, depending on the method of construction, method of operation, and size. Moreover, in the construction and operation of vacuum plants, factors such as the flow conductance and leak-tightness of valves are of great importance. 

Alphabetical list of variables, symbols and units frequently used in vacuum technology and its applications (see also DIN 28 402)... 

Vacuum Technology and Applications 1st Ed., 319 pages, 1991 Butterworth-Heinemann, Oxford... 

For fuller discussion, see Sanderson VdcMiizw Manipulation of Volatile Compounds John Wiley and Sons Ltd, NY, 1948 L.W.Muller Vacuum Technology Principles and Applications, Chapman Hall Ltd, 1995 W.H.Kohl Handbook of Materials Techniques for Vacuum Devices, American Institute of Physics Press, 1994 Shriver The Manipulation of Air-sensitive Compounds McGraw-Hill Book Co, NY, 1969 Brown Organic Syntheses via Boranes, Wiley, NY, 1975 A.Pelter Borane Reagents, Academic Press Inc., 1988. 

Wissler, G. L. and R. W. Carlson, Eds., 1979, Vacuum Science and Technology, Vol. 14 of Methods of Experimental Physics, L. Marlon and C. Marton, Eds. Academic, New York. An excellent multiauthor volume covering all major aspects of vacuum technology. The emphasis is on physical application and ultrahigh vacuum, but there is plenty of useful information for chemical applications. 

O Hanlon, J. F., 1980. A Users Guide to Vacuum Technology. Wiley, New York. This hook is oriented somewhat to semiconductor and optics applications. II has very useful sections on residual gas analysis. 

To familiarise the reader with the scope of vacuum technology, it begins with a summary of the vacuum pressure range and typical applications in the chemical sciences. 

In vacuum technology, some calculations involve the steady flow of fluid through duct of changing circular cross-section (diffusers, jets, nozzles, etc.) and the methods of gas dynamics can be applied to calculate pressures, velocities and temperatures. (A criterion for the applicability of gas dynamics is that Kn < 0.01 although, according to ref. (d), the methods can be applied even at Kn values up to 0.3.)... 

The identification and quantification (partial pressure measurement) of the gaseous components in vacuum systems is of increasing importance in vacuum technology. This is achieved by the widely applied method of residual gas analysis. The simple theory of this is stated and relevant examples illustrate the application. 

---