Triphenyl sulfonium hexafluoroantimonate

Figure 1. I PTSA, II latent sulfonic acid, III triphenyl-sulfonium hexafluoroantimonate.

A photochemical study- of the electron-transfer reactions of a sulfonium salt, 4-cyanobenzylmethylphenylsulfonium tetrafluoroborate, has been reported to give phenyl methyl sulfide quantitatively. 9,10-Dimethylanthracene and naphthalene have both been used in the sensitised reactions of triphenyl-sulfonium hexafluoroantimonate and the reactions encountered involve the singlet states and produce the radical-cation of the sensitiser and phenyl radicals. The phenyl radicals are formed by bond fission within the neutral triphenylmethyl radical. The reactions of some aromatic sulfonium compounds have been patented for use in resin compositions. ... 

In a modification of their work, Angelopoulos et al. [954] used a water-soluble functionality on the P(ANi) backbone which could be radiation cross-linked, leading to water-developable conductive resists. In yet another modification, they mixed solutions in NMP of undoped P(ANi) and the dopant/solubilizer, triphenyl sulfonium hexafluoroantimonate, and spin-coated water-developable discharge coatings therefrom. In charging test results, they found that in comparison with a ca. 5 pm displacement obtained with no P(ANi) underlayer beneath a 1.2 m, standard (diazonaphthoquinone-novolac) imaging resist, no displacement at all was observed when a 200 nm P(ANi) underlayer of surface conductivity ca. 1 S/cm was used. 

Furane, N-hydrotymaleimide (HOMI), styrene (St), p-methylstyrene (MeSt), and p-chlorostyrene (ClSt) were purchased from Aldrich Chemicd Co. Maleic anhy de and hydrotylamine hy(bochIoride were obtained fi om Kanto Chemical Co. p-Trimethylsilylstyrene (SiSt), p-(tcrf-but03tycarbonylo3 )styrene (t-BOCSt), and p-acetojqrstyrene (AcOSt) were kindly donated by Korea Kumho Petrochemical Co., Eastman Kodak Co., and Hoechst Celanese Corp., respectively. The styrene monomers (X-St) and solvents were purified by dstillation with standard procedures. Other chemicals were purified by conventional methods. The radical initiators, JV,N -azobis(isobutyronitrile) (AIBN) and dicumyl peroxide (DCP) were purchased from Aldrich and used after reciystaUization. As photoacid generators (PAG), triphenyl sulfonium hexafluoroantimonate and... 

Free radical polymerization is disturbed by oxygen, as shown in Chapter 1, while cationic polymerization shows no effect from oxygen. Epoxy or vinyl-ether compounds are used for cationic polymerization. Typical cationic polymers are shown in Figure 4.10. Photoinitiators are photoacid-generating compounds, di-(p-toluene)iodonium hexafluoroantimonate and triphenyl-sulfonium hexafluorophosphate, as shown in Figure 4.11. 

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