Tin Compounds For CVD Chemical Vapor Deposition

Tin Chemistry Laboratory, Departamento de Qmmica - Universidade Federal de Minas Gerais, Brasil 

Nanoscale materials are those with dimensions less than 100 nm. Most of the nanomaterials used, such as oxides, sulfides, nitrides, and others are well known, in many cases since the beginning of civilization. In recent decades, it has been observed that specific properties of these materials, useful in biomedical, electromagnetic, mechanical, and catalytic areas, can be enhanced by reducing particle size to nanoscale dimensions. Many synthetic strategies have been developed in order to obtain nanometric materials with specific properties. Thin films of powders, in particular, have been the subject of current investigations. Studies of new synthetic approaches for nanometric films are intimately connected with the development of the chemical vapor deposition technique, which has widespread acceptance and is used for the production of important supplies for semiconductor electronic applications.  

The chemical vapor deposition (CVD) process involves the deposition of a stable solid film, produced by chemical reactions of gaseous reactants in an activated (heat, light, plasma) environment. The chemical source materials, containing elements of which the thin film is to be made, can be gaseous, liquid, or solid.  

Tin Chemistry Fundamentals, Frontiers, and Applications Edited by Marcel Gielen, Alwyn Davies, Keidi Panned and Edward Tiekink 2008 John Wiley Sons, Ltd. ISBN 978-0-470-51771-0 

The film is formed in contact with the hot substrate. If the reacting gas is O2, for example, the film will be the corresponding metal oxide. 

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