Thin films vacuum deposited

Three techniques have been described in the literature to prepare combinatorial libraries of fuel cell electrocatalysts solution-based methods [8, 10-14], electrodeposition methods [15-17] and thin film, vacuum deposition methods [18-21]. Vacuum deposition methods were chosen herein for electrocatalyst libraries in order to focus on the intrinsic activity of the materials, e.g., for ordered or disordered single-phase, metal alloys. 

The sucrose thin films vacuum deposited on glass presented a good adhesion and for in IR analysis it is observed that the band intensity decreases when the thickness of sucrose thin films decreases. 

Yanagi, H., T. Kouzeki, and M. Ashida (1993). Epitaxial growth of naphthalocyanine thin films vacuum deposited on alkali halides. J. Appl. Phys. 73, 3812. 

Vacuum-based displays ultimately were unable to fulfiU the growing needs of the computer industry for a lightweight, low-power portable display that was less than an inch thick. It took the sohd-state revolution in electronic materials to identify candidates that could truly fill the needs of such devices. An early effort in electroluminescence was translated into hght-generating matrix displays such as the one shown in Fig. 7.16. The matrix itself is an array of pixels, each of which is a capacitor structure built of thin films vacuum-deposited... 

CoTe Stoichiometry unsure cubic 0=6.04 E, thin films. Vacuum deposited films on NaCl cleavage planes at 400°C. 73Gosl... 

Industrial Applications Boron-doped diamond (BDD) substrates Langmuir-Blodgett films thin films vacuum-deposited films - ... 

The deposition process is illustrated in the left part of Fig. 5. The precursor gases are sprayed on the surface by the nozzle , where they are adsorbed. In a second step, the incoming ion beam decomposes the adsorbed precursor gases. Then the volatile reaction products desorb from the surface and are removed through the vacuum system, while the desired reaction products remain fixed on the surface as a thin film. The deposited material is not fully pure however, because organic contaminants as well as Ga ions (from the ion beam) are inevitably included in the deposited film [23],... 

Hexamethylcyclotrisilazane and hexamethylcyclotrisiloxane were purified by rectification in vacuum following which their purity was tested by gas chromatography. Plasma polymerizations were carried out in an electrode system described previously ( ). Thin film were deposited in a 20 kHz glow discharge on the surface of stainless steel electrodes or on gold or silicon electrodes in the case of thin layers intended for further studies of electrical properties. All polymerizations were carried out at constant discharge parameters current density j = 1 mA/cm2, discharge duration t = 30 sec, monomer vapour pressure p = 0.3 Torr. 

Rubrene was purchased from Aldrich (elemental purity > 98%) and additionally purified by gradient sublimation Freshly cleaved mica (001) was used as substrate. Rubrene thin films were deposited by hot wall epitaxy in a vacuum chamber with a base pressure below 10 Pa at different deposition rates and substrate temperatures (Ts). Pole figures were measured with a Philips X pert x-ray diffractometer using CrKa radiation and a secondary side graphite monochromator. Specular scans were performed on a Bruker D8-Discover diffractometer using CuKa radiation. POWDER CELL and STEREOPOLE were used for the evaluation of the specular scans and simulation of pole figures. 

XRD studies show that synthesized composites do not contain any crystal phase, just an amorphous phase. Optical absorption measurements prove that synthesized nanocomposites are containing Ti02 and Ti phases. For comparative analysis the pure Ti containing thin film was deposited onto the cold substrate (77 K) and onto the substrate at room temperature. The same result was obtained XRD analysis shows that the synthesized films only contain the amorphous phase. Kinetics of the electrical resistance increase with the air exposure of Ti/PPX nanocomposites (after synthesis under vacuum) is similar to that of the Al/PPX ones. For a metal content below the percolation threshold the metal particles became insulator within several seconds, whereas for the samples beyond the threshold the observed resistance increase is per cents within several hours. DTA analysis revealed that the heating of amorphous Ti02 nanoparticles up to a temperature of 480°C leads to a phase transformation to anatase, whereas heating up to 580°C results in the anatase transformation to the mtile structure. 

Berg S, Johannsmann D (2001) Laterally coupled quartz resonators. Anal Chan 73(6) 1140-1145 Stafford GR, Bertocci U (2009) In situ stress and nanogravimetric measurements during hydrogen adsorption/absorption on Pd ovo-layers deposited onto (lll)-Textured Au. J Phys Chem C 113 13249-13256 Way AS (1993) Quartz resonator techniques for simultaneous measurement of areal mass density, lateral stress, and temperature in thin films. Vacuum 44(3/4) 385-388... 

E. Spassova (2003) Vacuum deposited polyirnide thin films. Vacuum. 70 551-561. 

Figure 2. Schematic ilhistiatian of the nanoq)here lithography Cabricatioo technique. A small vohime of nanosphere solution is diop-coated onto the clean substrate. As die solvent evaporates, die nanoqiheres assemble into a two-dimensional colloidal crystal mask. The desired noble metal is then dqpodted in a hi vacuum thin film vapor deposition tem. In the last step of the sam de prqnratioii, the lift-off step, the nanospheres are removed by sonication in absolute ethanol.

Magnetic tape media are divided into two categories (Onodera et al., 1996a) i.e., particulate media where magnetic particles are dispersed in a polymer matrix with some additives and coated onto the polyethylene terephthalate (PET) substrate, and thin film media in which monolithic magnetic thin films are deposited onto the substrate in a vacuum, which is discussed in this chapter. For magnetic tape helical scan systems, the tap>e is driven by a pinch roller and a tension (0.2 - 0.5 N) is applied. 

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