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Thickness of wetting layer

When the thickness of wet layer of coating is less than 1 mm, as is often the case with almost all coatings, convection cells are almost always due to the surface tension gradients. ... [Pg.413]

Another very complicated problem where the approach to equilibrium with time after a quenching experiment is described by an asymptotic law is the owth of wetting layers, in a situation where thermal equilibrium would require the surface to be coated with a macroscopically thick film, but is initially nonwet. For a short-range surface potoitial as discussed in section 3.5, analytical theories predict for a non-conserved density a growth of the thicknm of the layer according to a law f(t) oc In t, and this has in fact been observed by simulations . In the case where the surface potential decays with stance z from the surface as z, the prediction for the thickness l(t) is for the nonconserved case and... [Pg.144]

While the static equilibrium behavior of polymer blends in thin film geometry thus is rather well understood, at least in principle, the kinetic behavior (Sects. 2.8,3.3) is much less well understood, since there is a delicate interplay between surface-directed spinodal decomposition, thickness-limited growth of wetting layers, and the hydrodynamic mechanisms of coarsening in this constrained geometry still needs investigation. [Pg.81]

The thickness of wet adsorbed HRP layer evaluated on the basis of the QCM data is more than two times higher than the hydrodynamic diameter of a HRP molecule (6 nm) [6]. Since resonator oscillations drag every molecule below the shear-plane (swollen HRP molecules and solvent in adsorbed layer, etc.), it is impossible to conclude solidly if the HRP adsorption on the resonator surface is a polymolecular one or not. [Pg.355]

So far we have described in some detail the development of wetting layers by accretion. Obviously, the other direction is also possible a thick, macroscopic liquid layer on a solid can thin (by gravity, evaporation or capillary suction) until the layers become of colloidal thickness. Eventually, the same final situation should be attained, unless the dynamics of dewetting leads to hysteresis. [Pg.597]

The instability of the AFM pictures obtained for Samples A (freezing of distilled water) can be explained by the possible variation of the thickness of liquid layer on the rough surface" and the lack of thermal equilibrium between tip and surface in the first minutes of measurements. The large roughness of frost crystals makes AFM investigations difficult, especially in tapping mode. Moreover, as soon as the tip comes into contact with the liquid layer at the ice/air interface, it is wetted by the liquid and pulled towards the sample surface, which potentially deforms the sample. [Pg.353]

A last complication results from the measurement of the thickness of supported layers. This can easily be done with SEM for calcined layers. Wet lyogel, or even dry xerogel, layers cannot be measured in this way. Reproducible thickness measurements on wet lyogel films could not be obtained with other easy-to-perform methods. Consequently layer thicknesses were measured after calcination. Estimates of the shrinkage in the thickness direction were made for supported alumina (boehmite) membranes dried at 40°C and 60% RH made with a standard precursor solution of 1 mol AlOOH/1 stabilised at pH = 4 by... [Pg.286]

Fig. 54. Schematic phase diagrams for wetting and capillary condensation in the plane of variables temperature and chemical potential difference, (a) Refers to a case in which the semi-infinite system at gas-liquid condensation (ftaKX — d = 0) undergoes a second-order wetting transition at T = 7V The dash-dotted curves show the first-order (gas-liquid) capillary condensation at p = jt(I), T) which ends at a capillary critical point T v, for two choices of the thickness D. For all finite D the wetting transition then is rounded off. (b), (c) refer to a case where a first-order wetting transition exists, which means that ps remains finite as T - T and there jumps discontinuous towards infinity. Then for /iaKX - /i > 0 a transition may occur during which the thickness of the layer condensed at the wall(s) jumps from a small value to a larger value ( prewelting ). For thick capillaries, this transition also exists (c) but not for thin capillaries because then /Jcnn - (D,T) simply is loo large. Fig. 54. Schematic phase diagrams for wetting and capillary condensation in the plane of variables temperature and chemical potential difference, (a) Refers to a case in which the semi-infinite system at gas-liquid condensation (ftaKX — d = 0) undergoes a second-order wetting transition at T = 7V The dash-dotted curves show the first-order (gas-liquid) capillary condensation at p = jt(I), T) which ends at a capillary critical point T v, for two choices of the thickness D. For all finite D the wetting transition then is rounded off. (b), (c) refer to a case where a first-order wetting transition exists, which means that ps remains finite as T - T and there jumps discontinuous towards infinity. Then for /iaKX - /i > 0 a transition may occur during which the thickness of the layer condensed at the wall(s) jumps from a small value to a larger value ( prewelting ). For thick capillaries, this transition also exists (c) but not for thin capillaries because then /Jcnn - (D,T) simply is loo large.
Next, the sacrificial layer is patterned and holes are etched into the oxide using established lithography and etching processes. These holes will be filled and thus act as anchor points on the left end of the two cantilevers formed later (Fig. 5.3.1 e). In the next step, the functional polysilicon layer is deposited (Fig. 5.3.1b). The thickness of this layer determines the mechanical properties of the movable beam. The thicker it is, the stiffer the beam will be in the z axis, which is desirable for structures intended to move only in the xy direction. But its thickness is limited by the capabilities of the deposition process used. The functional layer is next patterned and etched (Fig. 5.3.1c). Depending on the thickness of the polysilicon layer, specific trench etch processes (as described later on) may be required, especially when this layer is rather thick. Finally, the sacrificial layer is removed (Fig. 5.3.1 d). This is typically done with wet or vapor phase etches to dissolve the silicon dioxide and leave parts of the functional structures free-standing and movable. When using wet etching, special care has to be taken to prevent Stic-... [Pg.104]

The displacement of liquids is strongly affected by surface properties of the system crude oil-water-rocks. With increases in temperature, surface properties of both the formation rocks and the formation liquids change. When water is injected into the formation, some of the surface-active substances of the crude dissolve in the water. This dissolution brings about a reduction in surface tension at the phase boundary. Selective wetting of the surfaces of capillary pores with water is also improved. The surface-acdve molecules of oil form a layer that is adsorbed on the surfaces of pore canals. When the temperature is increased, the thickness of this layer is reduced, which, in turn, leads to an increase in permeability of the formation. [Pg.26]

Water, which is always present, albeit sometimes just in traces, is adsorbed on the silica surface, and an aqueous layer is formed. The thickness of this layer, which can vary depending on flow, nature of the mobile phase, temperature etc., has a profound influence on the characteristics of polar stationary phases. If the original heptane in our case was wet , say a water content of 100 ppm, and the freshly prepared heptane is dry, with only 20 ppm water, this difference can have an enormous impact on the separation. [Pg.85]

It is considerably larger in the confined liquid crystals above Tni than in the bulk isotropic phase. The additional relaxation mechanism is obviously related to molecular dynamics in the kHz or low MHz frequency range. This mechanism could be either order fluctuations, which produce the well-known low-frequency relaxation mechanism in the bulk nematic phase [3], or molecular translational diffusion. Ziherl and Zumer demonstrated that order fluctuations in the boundary layer, which could provide a contribution to are fluctuations in the thickness of the layer and director fluctuations within the layer [36]. However, these modes differ from the fluctuations in the bulk isotropic phase only in a narrow temperatnre range of about IK above Tni, and are in general not localized except in the case of complete wetting of the substrate by the nematic phase. As the experimental data show a strong deviation of T2 from the bulk values over a broad temperature interval of at least 15K (Fig. 2.12), the second candidate, i.e. molecular translational diffusion, should be responsible for the faster spin relaxation at low frequencies in the confined state. [Pg.179]

On the assumption that the film formed on the sapphire window has the density and optical properties known for the coexisting liquid, one can employ the theory of the reflectance of thin absorbing slabs (Beming, 1963) to obtain the layer thicknesses from the reflectivity data (Yao and Hensel, 1996). The density dependence of the refractive index n of mercury vapor was determined from reflectivity data at temperatures far above T, or below T. A selection of wetting layer thicknesses estimated in this way are displayed in the inset of Fig. 6.9. [Pg.210]


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