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The Formation of a p-n Junction

As stated in the introduction to this chapter, semiconductor detectors operate like ionization counters. In ionization counters (see Chap. 5), the charges [Pg.246]

An n-type semiconductor has an excess of electron carriers. A p-type has excess holes. If a p-type and an n-type semiconductor join together, electrons and holes move for two reasons  [Pg.248]

Both electrons and holes will move from areas of high concentration to areas of low concentration. This is simply diffusion, the same as neutron diffusion or diffusion of gas molecules. [Pg.248]

Under the influence of an electric field, both electrons and holes will move, but in opposite directions because their charge is negative and positive, respectively. [Pg.248]

The potential Vq (Fig. 7.17a) depends on electron-hole concentrations and is of the order of 0.5 V. If an external voltage V/, is applied with the positive pole [Pg.248]


A lilhium-drifted detector is formed by vapor-depositing lithium on the surface of a p-doped silicon crystal. When the crystal is heated to 4(X) C to 5(X) C the lithium diffuses into the crystal. Because lithium easily loses electrons, its presence converts the p-lype region to an n-type region. While still at an elevated temperature, a dc voltage applied across the crystal causes withdrawal of Ihe electrons from the lithium layer and holes from Ihe p-type layer. Current across thepn junction causes migration, or drifting, of lithium ions into the p layer and formation of the intrinsic layer, where the lithium ions replace the holes lost by conduction. When the crystal cools, this central layer has a high resistance relative to the other layers because the lithium ions in this medium are less mobile than the holes they displaced. [Pg.316]

Figure 4.21. Schematic of carrier flow within a p-n junction. Shown are (a) the diffusion of free electrons from n- to p-type Si resulting in recombination with holes, (b) formation of a depletion zone that repels the flow of electrons and holes from n- and p-type regions, respectively, (c) application of a reverse bias, resulting in widening the junction potential, eVo, (d) application of a forward bias, which lowers eVo and results in an exponential voltage spike once a threshold bias of Vd is applied, (e). Figure 4.21. Schematic of carrier flow within a p-n junction. Shown are (a) the diffusion of free electrons from n- to p-type Si resulting in recombination with holes, (b) formation of a depletion zone that repels the flow of electrons and holes from n- and p-type regions, respectively, (c) application of a reverse bias, resulting in widening the junction potential, eVo, (d) application of a forward bias, which lowers eVo and results in an exponential voltage spike once a threshold bias of Vd is applied, (e).
Figure 10. Effect of fixed oxide/insulator charge on the effective junction space-charge region (a) flat-band condition (b) positive fixed charge causes inversion of the p side and formation of a n-type surface channel (c) negative fixed charge causes accumulation of the p side and a narrow field induced junction at the surface (d) larger amount of negative fixed charge causes inversion of the n side and formation of a p-type surface channel. (With permission of Academic Press.)... Figure 10. Effect of fixed oxide/insulator charge on the effective junction space-charge region (a) flat-band condition (b) positive fixed charge causes inversion of the p side and formation of a n-type surface channel (c) negative fixed charge causes accumulation of the p side and a narrow field induced junction at the surface (d) larger amount of negative fixed charge causes inversion of the n side and formation of a p-type surface channel. (With permission of Academic Press.)...

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