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Technology of Formation

Changes in Temperature, H2SO4 Concentration and Open Circuit Cell Voltage During Active Mass Formation [Pg.501]

The changes in temperature during tank and battery (container) plate formation are presented in Fig. 12.1. [Pg.501]

When the plates are immersed into the solution, chemical reactions proceed between PbO, basic lead sulfates and H2SO4. Since these reactions are exothermic, the temperature in the tank or battery rises. The temperature rise differs for the two formation methods. [Pg.501]

Changes in temperature during soaking and formation of battery plates. Based on data from [1]. [Pg.501]

In the tank formation method, the heat capacity of the tank is great and the concentration of the H2SO4 solution is low (1.06 rel. dens.), so a small quantity of paste is sulfated and less heat is generated (and at a lower rate) during the formation process. Hence, the temperature reaches a maximum after the PbO and basic lead sulfates in the surface paste layers have reacted with most of the H2SO4 solution. [Pg.502]


Two useful membranes developed by the group at the Oak Ridge National Laboratory have dominated the application of dynamic membranes the hydrous zirconium oxide ultrafilter and the hydrous zirconium oxide-poly(acrylic acid) hyperfilter. The technology of formation and utilization of zirconium oxide-poly(acrylic acid) dynamic membranes has been described in detail by Thomas ( ). The effects of molecular weight of the poly(acrylic acid), pore diameter of the porous support, formation cross-flow velocity, formation pressure, and pH of poly(acrylic acid) solution during initial deposition of the polyacid on the hyperfiltration performance are described and discussed. [Pg.296]

The following parameters play an essential role in the technology of formation. [Pg.100]

There are two types of technology of formation of porous silicon layer on silicon solar cells (1) the thin porous silicon is formed in the final step on the surface of ready Si solar cell with metal contacts and (2) the relatively thick porous silicon layer is fomied prior to emitter diffusion and metal contact deposition. In the first case, which is more applied, the thickness of porous layer (70-150 nm) must be less than the depth of n -p (or p -n)-junction (300-800 nm), and the duration of electrochemical etching is short (about 5-15 s). [Pg.506]

Although not commercialized, both Elf Atochem and Rn hm GmbH have pubUshed on development of hydrogen fluoride-catalyzed processes. Norsolor, since acquired by Elf Aquitaine, had been granted an exclusive European Hcense for the propylene-hydrogen fluoride technology of Ashland Oil (99). Rn hm has patented a process for the production of isobutyric acid in 98% yield via the isomerization of isopropyl formate in the presence of carbon monoxide and hydrofluoric acid (100). [Pg.252]

Water Treatment. Several components must be treated simultaneously in a multicomponent mixture as available in wastewaters to prove the technology of heterogeneous photocatalysis. The formation and subsequent elimination of intermediates in the photooxidative process must be monitored, identifying all intermediates and final products. [Pg.402]

Photopolymerization reactions are widely used for printing and photoresist appHcations (55). Spectral sensitization of cationic polymerization has utilized electron transfer from heteroaromatics, ketones, or dyes to initiators like iodonium or sulfonium salts (60). However, sensitized free-radical polymerization has been the main technology of choice (55). Spectral sensitizers over the wavelength region 300—700 nm are effective. AcryUc monomer polymerization, for example, is sensitized by xanthene, thiazine, acridine, cyanine, and merocyanine dyes. The required free-radical formation via these dyes may be achieved by hydrogen atom-transfer, electron-transfer, or exciplex formation with other initiator components of the photopolymer system. [Pg.436]

The formation and stability of peroxoniobates and peroxotantalates can be used successfully in the technology of tantalum and niobium oxide production. Belov, Avdonina and Mikhlin [512] investigated processes of precipitation and thermal decomposition of high-purity ammonium tetraperoxoniobate and tetraperoxotantalate as precursors for the production of tantalum and niobium... [Pg.304]

Tafel plots, during electrode polymerization, 316 Technology of electrochemical polymer formation, 427 Temperature coefficient and the interfacial parameter, 183 and the potential of zero charge, 182 of potential of zero charge as a function of crystal phase, 87... [Pg.643]


See other pages where Technology of Formation is mentioned: [Pg.100]    [Pg.501]    [Pg.503]    [Pg.505]    [Pg.507]    [Pg.509]    [Pg.511]    [Pg.513]    [Pg.515]    [Pg.517]    [Pg.519]    [Pg.521]    [Pg.523]    [Pg.525]    [Pg.527]    [Pg.529]    [Pg.531]    [Pg.84]    [Pg.100]    [Pg.501]    [Pg.503]    [Pg.505]    [Pg.507]    [Pg.509]    [Pg.511]    [Pg.513]    [Pg.515]    [Pg.517]    [Pg.519]    [Pg.521]    [Pg.523]    [Pg.525]    [Pg.527]    [Pg.529]    [Pg.531]    [Pg.84]    [Pg.344]    [Pg.530]    [Pg.52]    [Pg.112]    [Pg.432]    [Pg.279]    [Pg.223]    [Pg.234]    [Pg.458]    [Pg.16]    [Pg.636]    [Pg.691]    [Pg.12]    [Pg.191]    [Pg.207]    [Pg.337]    [Pg.103]    [Pg.160]    [Pg.253]    [Pg.725]    [Pg.242]   


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Technological parameters of formation process

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