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Styrene, structure enhancements

Figure 17. H P ID-nOe spectra of p-Hj enhanced (H)2Rh(PPh3)2(p-Cl)2Rh(PPh3) (styrene) (structure inset) at 295 K showing intramolecular hydride interchange and conversion to ethylbenzene during the 200 ms exchange time. The largest peaks in each trace correspond to the excitation or spin labelling point while the three smaller peaks are due to chemical exchange. Figure 17. H P ID-nOe spectra of p-Hj enhanced (H)2Rh(PPh3)2(p-Cl)2Rh(PPh3) (styrene) (structure inset) at 295 K showing intramolecular hydride interchange and conversion to ethylbenzene during the 200 ms exchange time. The largest peaks in each trace correspond to the excitation or spin labelling point while the three smaller peaks are due to chemical exchange.
Chiral bis-(binaphthophosphole) (bis(BNP)) ligands have been used in the asymmetric hydroformylation of styrene. In solution, the free diphospholes display fluxional behavior. Consistent with their structure, the reaction of the bis(BNP) compounds with platinum(II) derivatives gives either cis chelate mononuclear complexes or trans phosphorus-bridged polynuclear derivatives. Coordination to platinum enhances the conformational stability of bis(BNP)s and diastereomeric complexes can be detected in solution. In the presence of SnCl2, the platinum complexes give rise to catalysts that exhibit remarkable activity in the hydroformylation of styrene. Under optimum conditions, reaction takes place with high branched selectivity (80-85%) and moderate enantio-selectivity (up to 45% ee). [Pg.171]

PC/SAN alloys are blends of polycarbonate (PC), styrene-acrylonitrile copolymer (SAN) and a special rubber system. The enhanced resistance to therm ageing allows applications such as instrument panel support for the Ford Focus C-MAX, support structures for centre consoles, armrests and cup holders. [Pg.649]

The polymer resist exhibiting the lowest PE rate or highest etch resistance versus PMMA or oxide is poly(styrene) (see Table IV). This system, like the others of Table IV, is representative of a vinyl pol3mier with general structural formula of -(CH2-CXY)-. Poly(chlorostyrene), a chlorinated derivative of the aromatic poly(styrene), exhibits equal resistance towards all three dry etch processes. Here halogenatlon has not enhanced the etch rate or reduced the resistance as seen before for PTECM, PTFEM, and PMCA nonaromatic systems. Therefore, the aromatic side group must... [Pg.67]

IR and UV-vis spectroscopy show that the majority of the encapsulated complexes still have structural integrity. As observed for many other oxidation catalysts, entrapment shows significantly enhanced activity. This effect is more pronounced when the degree of ligand substitution with Cl is higher. The simultaneous occurrence of two mechanisms is confirmed again, the selectivity of the encapsulated Mn(salen) complexes for the formation styrene epoxide is only 30%, the dominant product being benzaldehyde. [Pg.230]


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Enhancer structure

Structure enhancement

Styrene structure

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