Structure Formation via Block Copolymer Self-Assembly

Structure Formation via Block Copolymer Self-Assembly 

All resists and technologies described so far originate liom pursuing a top-down approach. Smaller features can be obtained by using lower wavelength irradiation, more sensitive resists for smaller wavelengths, and better optics. In a bottom-up approach structures can be fabricated by self-assembly processes as weU. 

Well-controlled architectures can be obtained in block copolymers (see examples in Fig. 7), and the equUibrium structures can be controlled by macromolecule design. The morphology of microdomains formed by pure diblock copolymers has been intensively researched and is by now a relatively well-understood area.  

In neat diblocks three classical ordered microphases are usually distinguished. These include alternating lamellae, hexagonaUy packed cylinders, and body-centered-cubic packed spheres. In addition, some other, more complex microstructures may appear, especially near the order-disorder transition. 

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Structure Formation via Block Copolymer Self-Assembly. 102... 

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