Special Device Configurations

The improvements described above have been obtained via the design and development of new semiconducting polymers, with wide, medium, and small bandgaps, and by the improvement of the interconnecting layers in regular or inverted series-connected multi-junction cells. In addition to the 

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The transistor had a tremendous impact, constituting the birth of modern electronics. The transistor led to the development of almost innumerable semiconductor device configurations and ultimately to the phasing out of the vacuum tube, except for rather special and limited applications. 

The possibility to produce structures with the required LC director alignment within the selected areas of the cell, thus allowing pixel dividing to enable new special LC device configurations for transflective, multidomain, 3D, and other new display types. 

External control of the process is achieved by devices that are specially designed, selected and configured for the intended process-control application. The text below covers three very common function classifications of process-control devices controllers, final control elements, and regufators. 

Mechanical rheometry requires a measurement of both stress and strain (or strain rate) and is thus usually performed in a simple rotating geometry configuration. Typical examples are the cone-and-plate and cylindrical Couette devices [1,14]. In stress-controlled rheometric measurements one applies a known stress and measures the deformational response of the material. In strain-controlled rheometry one applies a deformation flow and measures the stress. Stress-controlled rheometry requires the use of specialized torque transducers in conjunction with low friction air-bearing drive in which the control of torque and the measurement of strain is integrated. By contrast, strain-controlled rheometry is generally performed with a motor drive to rotate one surface of the cell and a separate torque transducer to measure the resultant torque on the other surface. 

Concerning AFS, the atomiser can be a flame, plasma, electrothermal device or a special-purpose atomiser e.g. a heated quartz cell). Nowadays, commercially available equipment in AFS is simple and compact, specifically configured for particular applications e.g. determination of mercury, arsenic, selenium, tellurium, antimony and bismuth). Therefore, particular details about the components of the instrumentation used in AFS will not be given in this chapter. 

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