Silicone-based negative resist preparation

Preparation and Resolution Characteristics of a Novel Silicone-Based Negative Resist... 

We have developed a new silicone based negative resist (SNR) by introducing the chloromethyl group into polydiphenylsiloxane. SNR has a high Tg (170 C), good electron beam sensitivity and excellent durability to 02 RIE (9). In this paper we describe the SNR preparation and characteristics, and demonstrate a high resolution of 2LR system using this resist. 

A new silicone-based negative resist (SNR) for two layer resist systems was designed and prepared. It showed excellent dry etching durability to 02 RIE, high sensitivity to electron beam, X-ray and deep UV, and high resolution. Two layer resist with SNR/AZ resist is very effective to achieve submicron patterns with high aspect ratio, and will be used for the fabrication of submicron patterns over topography such as the metallization of electrode patterns in the last step of VLSI fabrication process. 

The first step involving the preparation of master is spin coating of silicon wafer with SU-8 negative resist. Subsequently, UV exposure is carried out with a clear field mask. This is followed by the development of SU-8 master. Glass posts are placed on SU-8 master to define the inlets and reservoirs. PDMS is mixed with prepolymers having weight ratio of the base and... 

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