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Silicon calculations

The phenomena of beam broadening as a function of specimen thickness are illustrated in Fig. 4.20 each figure represents 200 electron trajectories in silicon calculated by Monte Carlo simulations [4.91, 4.95-4.97] for 100-keV primary energy, where an infinitesimally small electron probe is assumed to enter the surface. In massive Si the electrons suffer a large number of elastic and inelastic interactions during their paths through the material, until they are finally completely stopped. The resulting penetration depth of the electrons is approximately 50 pm and in the... [Pg.196]

Table 1. Energy band gaps of diamond and silicon calculated by FLAPW-LDA and FLAPW-SIC schemes. The experimental values [34] are also shown. Units are in eV. Table 1. Energy band gaps of diamond and silicon calculated by FLAPW-LDA and FLAPW-SIC schemes. The experimental values [34] are also shown. Units are in eV.
FIGURE 7.6 Critical nudeus radius of silicon calculated by homogeneous nucleation theory for 0.2 atm and 0.7 atm. Atomic radius of silicon is 0.146 run. From Sawano [18]. [Pg.273]

A projection showing the electron density on a (110) plane in. silicon, calculated as if silicon were a simple metal. [From Harrison, 1966a.]... [Pg.423]

The energies of the odd-parity states of donors in silicon calculated by variational and non-variational methods are given in Table 5.4. [Pg.136]

The experimental methods have made it possible to study materials over large ranges of pressures, which can change the properties of materials completely. Figure 7.2 shows the dependence of energy on volume for silicon calculated using the plane wave pseudopotential method and the local density approximation (these methods are described in Chapter 8). The calculated E(V) curve fits with experiment... [Pg.98]

Fig. 6.9 Phonon dispersion of silicon calculated by GAP solid lines), the Tersoff potential dotted lines) and PBE-DFT open squares)... Fig. 6.9 Phonon dispersion of silicon calculated by GAP solid lines), the Tersoff potential dotted lines) and PBE-DFT open squares)...
Fig. 6 The porosity versus the refraetive index of oxidized porous silicon, calculated for various initial porosities pin of the unoxidized film, 1 = 632.8 nm. The dot-dashed curves representing Si + V (porous silicon) and Si02 + V (porous oxide) bound the region of values having physical significance Pin is determined from the point of intersection of the p-n curve with the Si + V curve (Data from Astrova and Tolmachev 2000)... Fig. 6 The porosity versus the refraetive index of oxidized porous silicon, calculated for various initial porosities pin of the unoxidized film, 1 = 632.8 nm. The dot-dashed curves representing Si + V (porous silicon) and Si02 + V (porous oxide) bound the region of values having physical significance Pin is determined from the point of intersection of the p-n curve with the Si + V curve (Data from Astrova and Tolmachev 2000)...
Various structural and dynamical properties of supercooled liquid silicon calculated as function of pressure and temperature are now summarized. These properties include relaxation times, structural properties, and dynamical properties. In simulations, the structural relaxation times are calculated from the coherent intermediate scattering function F q, t)), which is defined as... [Pg.491]

Fig. 23. Temperature dependence of liquid layer thickness on the surface of silicon, calculated using relationship (10). Fig. 23. Temperature dependence of liquid layer thickness on the surface of silicon, calculated using relationship (10).
The reaction of methane (CH4) and chlorine produces a mixture of products called chloromethanes. One of these is monochloromethane, CH3CI, used in the preparation of silicones. Calculate AjH for the reaction... [Pg.452]

Figure Al.3.14. Band structure for silicon as calculated from empirical pseudopotentials [25],... Figure Al.3.14. Band structure for silicon as calculated from empirical pseudopotentials [25],...
Figure Al.3.16. Reflectivity of silicon. The theoretical curve is from an empirical pseudopotential method calculation [25], The experimental curve is from [31],... Figure Al.3.16. Reflectivity of silicon. The theoretical curve is from an empirical pseudopotential method calculation [25], The experimental curve is from [31],...
Figure Al.3.22. Spatial distributions or charge densities for carbon and silicon crystals in the diamond structure. The density is only for the valence electrons the core electrons are omitted. This charge density is from an ab initio pseudopotential calculation [27]. Figure Al.3.22. Spatial distributions or charge densities for carbon and silicon crystals in the diamond structure. The density is only for the valence electrons the core electrons are omitted. This charge density is from an ab initio pseudopotential calculation [27].
Figure Al.3.23. Phase diagram of silicon in various polymorphs from an ab initio pseudopotential calculation [34], The volume is nonnalized to the experimental volume. The binding energy is the total electronic energy of the valence electrons. The slope of the dashed curve gives the pressure to transfomi silicon in the diamond structure to the p-Sn structure. Otlier polymorphs listed include face-centred cubic (fee), body-centred cubic (bee), simple hexagonal (sh), simple cubic (sc) and hexagonal close-packed (licp) structures. Figure Al.3.23. Phase diagram of silicon in various polymorphs from an ab initio pseudopotential calculation [34], The volume is nonnalized to the experimental volume. The binding energy is the total electronic energy of the valence electrons. The slope of the dashed curve gives the pressure to transfomi silicon in the diamond structure to the p-Sn structure. Otlier polymorphs listed include face-centred cubic (fee), body-centred cubic (bee), simple hexagonal (sh), simple cubic (sc) and hexagonal close-packed (licp) structures.
Another view of the Si(lOO) etching mechanism has been proposed recently [28], Calculations have revealed that the most important step may actually be the escape of the bystander silicon atom, rather than SiBr2 desorption. In this way, the SiBr2 becomes trapped in a state that otherwise has a very short lifetime, pennitting many more desorption attempts. Prelimmary results suggest that indeed this vacancy-assisted desorption is the key step to etching Si(lOO) with Br2. [Pg.937]

Methfessel M, Rodriguez C O and Andersen O K 1989 Fast full-potential calculations with a converged basis of atom-centered linear muffIn-tIn orbitals structural and dynamic properties of silicon Phys. Rev. B 40 2009-12... [Pg.2232]

Figure B3.3.14. Template molecule in a zeolite cage. The CFIA stmcture (periodic in the calculation but only a fragment shown here) is drawn by omitting the oxygens which are positioned approximately halfway along the lines shown coimecting the tetrahedral silicon atoms. The molecule shown is 4-piperidinopiperidine, which was generated from the dicyclohexane motif suggested by computer. Thanks are due to D W Lewis and C R A Catlow for this figure. For fiirther details see [225]. Figure B3.3.14. Template molecule in a zeolite cage. The CFIA stmcture (periodic in the calculation but only a fragment shown here) is drawn by omitting the oxygens which are positioned approximately halfway along the lines shown coimecting the tetrahedral silicon atoms. The molecule shown is 4-piperidinopiperidine, which was generated from the dicyclohexane motif suggested by computer. Thanks are due to D W Lewis and C R A Catlow for this figure. For fiirther details see [225].
Note for highly substituted allenes containing silicon, gernanium or tin we observed deviations of the calculated chemical shifts from the measured values, and one should therefore treat these particular cases with special care. [Pg.256]

This computation is also referred to as calculating the zinc equivalent of the alloy. The increase in strength in this alloy series is caused by increased amounts of beta phase in the stmcture. The silicon brasses show similar hardening effects accompanying a second phase. Typical mechanical properties and electrical conductivity for various cast alloys are shown in Table 2. [Pg.238]

The temperature-independent parachor [P] may be calculated by the additive scheme proposed by Quale.The atomic group contributions for this method, with contributions for silicon, boron, and aluminum from Myers,are shown in Table 2-402. At low pressures, where Pi. pc, the vapor density term may be neglected. Errors using Eq. (2-168) are normally less than 5 to 10 percent. [Pg.416]

The tlrree impurities, iron, silicon and aluminium are present in the metal produced by the Kroll reduction of zirconium tetrachloride by magnesium to the extent of about 1100 ppm. After dre iodide refining process tire levels of these impurities are 350, 130 aird 700ppm respectively. The relative stabilities of the iodides of these metals compared to that of zirconium can be calculated from the exchange reactions... [Pg.92]

The installation costs for a single impressed current anode of high-silicon iron can be taken as Kj = DM 975 (S550). This involves about 5 m of cable trench between anodes so that the costs for horizontal or vertical anodes or for anodes in a common continuous coke bed are almost the same. To calculate the total costs, the annuity factor for a trouble-free service life of 20 years (a = 0.11, given in Fig. 22-2) should be used. For the cost of current, an industrial power tariff of 0.188 DM/kWh should be assumed for t = 8750 hours of use per year, and for the rectifier an efficiency of w = 0.5. The annual basic charge of about DM 152 for 0.5 kW gives about 0.0174 DM/kWh for the calculated hours of use, so that the total current cost comes to... [Pg.254]


See other pages where Silicon calculations is mentioned: [Pg.110]    [Pg.139]    [Pg.458]    [Pg.182]    [Pg.39]    [Pg.299]    [Pg.773]    [Pg.110]    [Pg.139]    [Pg.458]    [Pg.182]    [Pg.39]    [Pg.299]    [Pg.773]    [Pg.264]    [Pg.115]    [Pg.123]    [Pg.123]    [Pg.1884]    [Pg.2214]    [Pg.2220]    [Pg.2396]    [Pg.2412]    [Pg.17]    [Pg.177]    [Pg.311]    [Pg.471]    [Pg.94]    [Pg.11]    [Pg.497]   


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