SiCl4 SILICON TETRACHLORIDE

SiCl4 Silicon tetrachloride, 1 44 SiF4 Silicon tetrafluoride, 4 145 SiF6Ba Barium hexafluorosilicate, 4 145... 

CCRIS 1324 Chlorid kremicity CT1800 EINECS 233-054-0 HSDB 683 Silane, tetrachloro- Silicio(tetracloruro di) Silicium(tetrachlorure de) Siliciumtetrachlorid Siliciumtetrachloride Silicon chloride Silicon chloride (SiCl4) Silicon tetrachloride Tetrachlorosilane Tetra-... 

CU2O Dicopper oxide cr 80 SiCl4 Silicon tetrachloride g... 

The uses of these prefixes are illustrated by the names of several oxygen compounds (oxides) in Table 4.2. Other examples of compounds in which prefixes are used for naming are SiCl4, silicon tetrachloride SijFg, disilicon hexafluoride PCI5, phosphorus pentachloride and SClj, sulfur dichloride. 

Silicon reacts directly with chlorine to form silicon tetrachloride, SiCl4 (this reaction was introduced in Section 14.17, as one step in the purification of silicon). This compound differs strikingly from CC14 in that it reacts readily with water as a Lewis acid, accepting a lone pair of electrons from H20 ... 

An important reaction for the deposition of silicon nitride combines silicon tetrachloride (SiCl4) and ammonia ... 

Si02(.5 ) + 2 C(5 ) + 2 Cl2(g) SiCl4(/) + 2 CO(g) If the reaction goes in 95.7% yield, how much silicon tetrachloride can be prepared from 75.0 g of each starting material, and how much of each reactant remains unreacted ... 

Aminolysis of the corresponding halides is the preferred method for the synthesis of dialkylamino derivatives of boron,1 silicon,2 germanium,3 phosphorus,4 arsenic,5 and sulfur.6 (Dialkylamino) chlorosilanes are prepared stepwise by the reaction of silicon tetrachloride with dialkylamines. This method may be utilized equally well for the conversion of alkyl- or aryl-substituted halides [e.g., (CH3) SiCl4. ] or of oxide and sulfide halides (e.g., POCl3 or PSC13) to the corresponding dialkylamino compounds. 

In silicon tetrachloride, SiCl4, chlorine atoms can be replaced by methyl or other alkyl groups to give, for example, CH3SiCl3 and (CH3)2SiCl2. These two compounds are obtained when methyl... 

These systems may all be applied to the same compound. The name adopted is then a matter of choice or convenience. Thus, SiCl4 can be named silicon tetrachloride (binary), tetrachlorosilicon (coordination) and tetrachlorosilane (substitutive). No one name is better or more correct than any other. 

In the typical flame or vapor-phase hydrolysis process, which uses SiCl4 as the precursor, silicon tetrachloride vapor is fed into a flame using an oxygen carrier gas. Fine (<50 nm), amorphous silica particles form in the flame (57). 

Silicon tetrachloride, SiCl4, when passed over fragments of felspar (a silicate of aluminium and calcium) heated to whiteness in a porcelain tube, exchanges chlorine for oxygen, and yields a liquid boiling at about 137°, of the formula... 

The distillation of the azeotropic mixture SiCl4 + CH3CN from the lower layer, which consists of 70% of SiCl4, follows the extraction of silicon tetrachloride. 

Rectification can be conducted in packed towers filled with Raschig rings. The rectification separates three fractions. Fraction I, which consists of trichlorosilane with a small amount of dichlorosilane, is separated at 35 °C at the top of the tower. Fraction II (a mixture of trichlorosilane and silicon tetrachloride) is separated at 35-36 °C at the top of the tower (this fraction can later be sent into the tower tank for repeated rectification. Fraction III (tank residue) mostly consists of silicon tetrachloride. Subsequent rectification of fraction II yields HSiCl3 (95-100%) and SiCl4 (to 5%). For obtaining phenyltrichlorosilane by high-temperature condensation, this condensate can be used without rectification. 

In the temperature range below 500 °C the yield of silicon tetrachloride depends on the temperature of chlorination. If ferrosilicon is chlorinated at a temperature below 500 °C, e.g. at 300-350 °C, the chlorination products will contain alongside with SiCl4 small amounts (less than 0.4%) of high-boiling silicon chlorides, hexachlorodisilane and octachlorotrisilane. At further reduction of temperature the content of polychlorosilanes grows, at 200 °C it reaches 0.4%, and at 180 °C it is already 5.7% of the condensate quantity. 

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