Semiconductor plant ultrapure water production process

FIGURE 2.6 (See color insert following page 588.) Part of semiconductor plant ultrapure water production process. 

Figure 2.6 schematically illustrates sections of a typical semiconductor ultrapure water (UPW) production process in a semiconductor plant. The water circuit consists of two main sections (1) makeup (or central) system and (2) polishing loop, which provides water at the point of use. There are multiple locations in such a water process where membrane degassing could be needed as shown in the figure. Reverse osmosis is mostly used in makeup line as the primary purification means in such processes. In the past, large and inflexible vacuum towers were frequently used after RO to remove dissolved gases, such as O2, N2, and CO2. Membrane contactors are the norm today for replacement or supplement to vacuum towers in makeup lines, as shown in Figure 2.6. 

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