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Secondary electron emission spectroscopy

Modinos, A. (1984). Field, Thermionic, and Secondary Electron Emission Spectroscopy. Plenum, New York. [Pg.397]

Modinos, A. (1984), Field, Thermionic and Secondary Electron Emission Spectroscopy, Plenum Press, New York. Mogab, C.J., Adams, A.C., Flamm, D.L. (1979), J. Appl. Phys., vol. 49, p. 3796. [Pg.945]

The most frequently applied analytical methods used for characterizing bulk and layered systems (wafers and layers for microelectronics see the example in the schematic on the right-hand side) are summarized in Figure 9.4. Besides mass spectrometric techniques there are a multitude of alternative powerful analytical techniques for characterizing such multi-layered systems. The analytical methods used for determining trace and ultratrace elements in, for example, high purity materials for microelectronic applications include AAS (atomic absorption spectrometry), XRF (X-ray fluorescence analysis), ICP-OES (optical emission spectroscopy with inductively coupled plasma), NAA (neutron activation analysis) and others. For the characterization of layered systems or for the determination of surface contamination, XPS (X-ray photon electron spectroscopy), SEM-EDX (secondary electron microscopy combined with energy disperse X-ray analysis) and... [Pg.259]

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Electron emission

Emission spectroscopy)

Secondary electron

Secondary electron emission

Secondary emissions

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