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Resist sensitivity, improvement

Pioglitazone hydrochloride, a thiazolidinedione, acts primarily by decreasing insulin resistance. It improves sensitivity to insulin in muscle and adipose tissue and inhibits hepatic gluconeogenesis. It also improves glycemic control while reducing circulating insulin levels. [Pg.280]

Throughput of EL3 (see Table I) is limited almost equally by exposure time (current density/resist sensitivity), mechanical stepping and control system speed. Further improvement will require advances in all areas. [Pg.25]

X-ray lithography also takes advantage of the increased resist sensitivity due to the thinner imaging films of multilayer systems. Thinner imaging films further improve X-ray resolution by minimizing the penumbra effect, a problem associated with an uncollimated X-ray beam. Consequently, the oblique exposure of features near pattern edges are minimized by multilevel resist processes, thereby restoring the desired profile. [Pg.372]

Novel and simple methods for the immobilization of NPs need to be developed to further reduce the electron transfer resistance and improve the stability, sensitivity, selectivity, and life-span of the electrodes. [Pg.314]

Past efforts to improve the fabrication of microdevices have been closely connected with attempts to increase the resist sensitivity, S. In the case of the resists described in Section 9.1.3.1, S is limited by the quantum yields, which are much low-... [Pg.239]

The corrosion resistance is improved if compared with ferritic steels but the steels are sensitive to inter-crystalline corrosion as a result of chromium carbide precipitation at grain boundaries. Low carbon content or additional alloying metals like titanium, niobium, and tantalum, can suppress this sensitivity. [Pg.313]

SEM micrograph of 0.17 fxm line-space features obtained by exposure (40 mJ/cm ) of the polymer 2b and subsequent CVD treatment with MTEOS vapor for 40 min is shown in Figure 10(b). Figure 10(c) shows a SEM micrograph of 0.16 [im line-space images obtained using polymer 4. Exposure dose was 65 mJ/cm2 and CVD treatment was carried out with MTMOS for 4 min. The resist sensitivity of the polymers 2 b and 4 was much improved compared to the polymer 1. [Pg.319]


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Resist sensitivity, improvement halogenation

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