Quartz optically transparent optical image

Another electrode form is a thin film deposited on an optically transparent nondiamond substrate, such as undoped Si for IR or quartz for UV/Vis spectroelectrochemical measurements. Diamond deposition on Si for IR OTEs is rather straightforward and involves growth conditions similar to those described above. The resulting films are 2-4 gm thick with micrometer-sized grains of diamond randomly oriented over the surface. Deposition of thin films of diamond on quartz is a little more involved [118]. Figure 22 shows an optical image of a diamond/quartz OTE. The film has a blue hue to it due to the boron doping level. It is... 

Although a scanned aperture can be used to write arbitrary patterns, the predominant use of photolithography is in replicating a pattern on a mask into a layer of photoresist. Such a mask, also called photo mask, is either a nearly optical flat glass, which is transparent to near UV or a quartz plate, transparent to deep UV covered with a metal absorber pattern (about 800 A thick chromium layer). Such a mask is either placed in physical contact with the resists (contact mode), or an image of the mask is reduced and projected into the resists with an optical system (projection mode). 

Figure 1 Cast films of azobenzene bilayer membranes from water solutions (a) a selfstanding film peeled off a casting substrate (b) an optical transparent film prepared on a quartz plate (c) SEM image of film cross-section.

Imaging of IEF separation has been carried out. For instance, IEF of EGFP was achieved in a PMMA chip sealed with PDMS. Observation of fluorescence was achieved through the optically transparent PDMS layer [177]. In another report, IEF of pi markers was demonstrated on a quartz chip using whole-column UV (280 nm) absorption imaging [1041]. 

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