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Positive bonding defect

Note that the actual bonding condition is three-dimensional. In both of these cases, rotation of a water molecule results in either a positive or negative bonding defect which is electrically active. In the first case, a... [Pg.306]

The Pauli exclusion principle states that each quantum level of the defect may be occupied by up to two electrons, so that a defect with a single level can exist in three charge states dep>ending on the position of the Fermi energy, as illustrated in Fig. 4.3. For example, the dangling bond defect is neutral when singly occupied, and has a charge+e, 0 and —e when occupied with zero, one or two electrons. [Pg.99]

Fig.3 shows the defect position on the bonding interface and the model of the reflective echo. The defects are exists on each bonding surface as(ii) (iv), is no exist as (i). [Pg.835]

The second class of atomic manipulations, the perpendicular processes, involves transfer of an adsorbate atom or molecule from the STM tip to the surface or vice versa. The tip is moved toward the surface until the adsorption potential wells on the tip and the surface coalesce, with the result that the adsorbate, which was previously bound either to the tip or the surface, may now be considered to be bound to both. For successful transfer, one of the adsorbate bonds (either with the tip or with the surface, depending on the desired direction of transfer) must be broken. The fate of the adsorbate depends on the nature of its interaction with the tip and the surface, and the materials of the tip and surface. Directional adatom transfer is possible with the apphcation of suitable junction biases. Also, thermally-activated field evaporation of positive or negative ions over the Schottky barrier formed by lowering the potential energy outside a conductor (either the surface or the tip) by the apphcation of an electric field is possible. FIectromigration, the migration of minority elements (ie, impurities, defects) through the bulk soHd under the influence of current flow, is another process by which an atom may be moved between the surface and the tip of an STM. [Pg.204]

The tetrahedrally bonded materials, such as Si and Ge, possess only positional disorder however, materials of this type exhibit high density of defect states (DOS). It is only with the addition of elements such as hydrogen and/or a halogen, typically fluorine, that the DOS is reduced to a point such that electronic device appHcations emerge. These materials contain up to - 10 atomic % hydrogen, commonly called hydrogenated amorphous siHcon (i -Si H). [Pg.357]

The dotted line shows the extent of the positive defect due to packing of the water molecules in a lattice structure which violate the hydrogen-bonding network rule. [Pg.306]

The incorporation of phosphorus yields fourfold-coordinated P atoms, which are positively charged, as phosphorus normally is threefold coordinated. This substitutional doping mechanism was described by Street [52], thereby resolving the apparent discrepancy with the so-called S N rule, with N the number of valence electrons, as originally proposed by Mott [53]. In addition, the incorporation mechanism, because charge neutrality must be preserved, leads to the formation of deep defects (dangling bonds). This increase in defect density as a result of doping explains the fact that a-Si H photovoltaic devices are not simple p-n diodes (as with crystalline materials) an intrinsic layer, with low defect density, must be introduced between the p- and n-doped layers. [Pg.5]

CH3 -Zn with superstoichiometric (defect) zinc atoms (Zn -impurity centres of conductivity). The larger is the electric positivity of the metal in these complexes, the larger is the ionicity of the carbon-metal bond, carbon being at the negative end of the dipole. Thus, in the case of C - K bond, ionicity amounts to 51%, whereas for C - Mg and C - Zn bonds ionicity amounts to 35% and 18%, respectively [55]. Consequently, metalloorganic compounds are characterized by only partially covalent metal-carbon bonds (except for mercury compounds). [Pg.265]


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