POLYMERS FOR MICROELECTRONICS

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As part of an effort to develop high-performance, high-temperature-resistant polymers for microelectronics applications, we also recently described a series of both partially fluorinated and nonfluorinated poly(aryl ether ketone)s containing amide, amide-imide, cyano oxadizole, or pyridazine groups and characterized their thermal and electrical properties.11... [Pg.112]

Volksen W, Yoon DY, Hedrick JL (1991) In Grubb DT, Mita I, Yoon DY (eds) Materials science of high temperature polymers for microelectronics, MRS Symposium Proc, MRS, Pittsburgh, 227 23... [Pg.163]

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Jiang Y, Bassett DR (1994) In Thompson LF, Willson CG, Tagawa S (eds) Polymers for microelectronics. ACS Symposium Series 537,American Chemical Society, Washington, D.C.,p 40... [Pg.228]

Willson CG, MacDonald SA,Ito H,Fr chet JMJ (1990) In TabataY,Mita I,Nonogaki S, Horie K, Tagawa S (ed) Polymers for microelectronics. Kodansha, Tokyo, Japan, p 3... [Pg.229]

H. Ito, Chemical amplification resists for microlithography, Adv. Polym. Set, 172, 149 (2005). Ito, Y. Maekawa, R. Sooriyakumaran, and E.A. Mash, Acid catalyzed dehydration A new mechanism for chemically amplified lithographic imaging, Polymers for Microelectronics, ACS Symp. Series 537, L.F. Thompson, C.G. Willson, and S. Tagawa, Eds., p. 64, American Chemical Society, Washington, DC. (1994). [Pg.236]

S. Ando, T. Matsuura, and S. Sasaki, in Polymers for Microelectronics, Resists and Dielectrics (L. F. Thompson, V. G. Willson, and S. Tagawa, eds.), ACS Symposium Series 537, American Chemical... [Pg.302]

In Polymers for Microelectronics and Nanoelectronics Lin, Q., et al. ACS Symposium Series American Chemical Society Washington, DC, 2004. [Pg.1]

Polymers for microelectronics and Library of Congress Cataioging-in-Publication Data... [Pg.3]

Polymers for microelectronics and nanoelectronics / Qinghuang Lin, editor, Raymond A. Pearson, editor Jeffrey C. Hedrick, editor. [Pg.3]

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