Polishing Technologies

A polish technology that is just emerging from development by several CMP capital equipment suppliers is the pad feed polisher. This equipment is based on some fairly recently developed polish pad rolls. These polish pads are in a roll similar to 35-mm camera film. The pad is fed out to the wafer polish table, a wafer is polished, the pad is conditioned, the pad is incremented forward, and then the next wafer is polished. 

Membranes are useful for stable emulsion removal particularly water-soluble oily wastes (8). This process is generally regarded as polishing technologies for emulsified oils. The low effluent concentrations of oil less than 5 mg/L could be achieved by this technique (2). Membrane processes have several advantages as described as follows (8,53) ... 

Polishing often cannot be done by hand because the structures do not allow it. Other polishing technologies have to be closely examined to determine what impact they have on the surface and the structures. This may lead to undesirable erosion and rounding of edges and corners. The selection of appropriate materials is a must . 

The influence of stearic acid methyl ester on crosslinking of elastomer compounds and elastomer properties has been studied. The purpose of the research is to recognise the possibility of application of stearic acid esters which have been obtained according to Polish technology from waste technical fats as the crosslinking activator of diene elastomers. 7 refs. 

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