Remote plasma region

In PECVD, the plasma generation region may be in the deposition chamber or precede the deposition chamber in the gas flow system. The latter configuration is called remote plasma-enhanced CVD (RPECVD). In either case, the purpose of the plasma is to give activation and partial reaction/reduction of the chemical precursor vapors so that the substrate temperature can be lowered and still obtain deposit of the same quaUty. 

Despite much lower production than PCBs, PCNs are now found to be widespread in the environment, having been detected in biological samples from even remote regions of the Arctic [73,74], Consumption of contaminated fish is considered to be an important route of exposure of humans to PCNs. High concentrations ofpenta- and hexachloronaphthalenes in human blood plasma have been correlated with fish consumption [75]. 

Plasma treatment equipment may have the substrate in the plasma-generation region or in a remote location. A common configuration places the substrate on the driven electrode in a parallel plate rf plasma system such as is shown in Figure 1.2. When plasma treating a surface, it is important that the plasma be uniform over the surface. If this condition is not met, non-uniform treatment can occur. This is particularly important in the rf system where, if an insulating substrate does not completely cover the driven electrode, the treatment action is shorted out by the regions where the plasma is in contact with the metal electrode. To overcome this problem, a mask should be made of a dielectric material that completely covers the electrode with cutouts for the substrates. ... 

In plasma processing, the deposition conditions differ greatly, depending on whether the substrate is placed on an active electrode, in the plasma-generation region, or in a remote position where the plasma afterglow is found. 

Afterglow (plasma) The region outside the plasma-generahon region where long-lived plasma species persist. Also called Downstream location Remote location. 

Downstream region (plasma technology) Plasma outside the plasma generation region. See Remote plasma source Afterglow region. 

Remote region (plasma) The plasma region outside the plasma-generation region where the electron energy is low. See also Afterglow Downstream region. 

In this section, low resistance tunnel junctions prepared by natural oxidation [42-45] or remote plasma oxidation techniques [46] will be described, since up to now they have provided the lowest junction resistances, required to supplant spin valves for read head applications above 100-200 Gbit/in2. At the heart of tunnel junction fabrication lays the barrier fabrication. For read head applications, in the 100-300 Gbit/in2 region, junction resistance must be around 1 Qpm2 [47-51]. Figure 9(a) shows a TEM micrograph for a 1 nm thick AlHfOx low RA barrier [52],... 

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