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Photoresists-Acid detection

Amperometric detection was achieved on two patches of C films (formed by CVD of 3,4,9,10-perylenetetracarboxylie dianhydride) on a glass chip. The microchannels were formed using a 23- im-thick photoresist as a spacer. Glucose oxidase and lactate oxidase were immobilized with HRP on the C films via a coated film of osmium PVPD polymer. Simultaneous measurements of glucose and lactate in rat brain cerebrospinal fluid (first perfused with 50 mM veratridine) were achieved. These two films were spatially separated in order to avoid interdiffusion of H202 formed from the two separate enzymatic reactions. Moreover, the two films were preceded by a third C film immobilized with ascorbate oxidase in order to remove ascorbic acid interference [759]. [Pg.217]

The detection and quantification of the acid formed have been done in two ways in situ within the photoresist film, and in solution, the exposed him being developed with an appropriate solvent, and the acid titrated with a base in the presence of an acid-base indicator whose spectroscopic properties were easily monitored [ 18,34—39]. [Pg.491]

Major Applications Display device, photoresists, solar cells,inks, highlighters, rubber, lithium battery, petroleum products, leak detection method, decoder system, packaging materials, hair dyes, cosmetics, wound dressing materials, antitumor agent, determination of nucleic acids ... [Pg.173]

Major Applications Waveguides, LED sensors, photoresists, Uquyid crystals, sol-gel matrix, optical sensors,io paints, toys, detection of thiols, food freshness sensors,i" dental product, saliva sampling method, detecting lactic acid, carbohydrates ... [Pg.231]

SECM has been particularly promising for microfabrication and detection of biological molecules, mainly due to the mild patterning conditions and various modes of operation (see also Section 12.4.6.2.3). In contrast, conventional photolithographic techniques are usually limited due to the photoresists, organic solvents, and strong acids and bases that are necessary and are harmful to biological molecules. [Pg.522]


See other pages where Photoresists-Acid detection is mentioned: [Pg.225]    [Pg.185]    [Pg.492]    [Pg.1423]    [Pg.8]    [Pg.212]    [Pg.47]    [Pg.286]    [Pg.253]   
See also in sourсe #XX -- [ Pg.491 ]




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