Periodic acid as oxidant

The use of iodate and periodic acid as oxidizers for noble metal CMP has also been attempted. Similar to W CMP, a surface oxidation or modification is required for the subsequent removal by mechanical force. For example, the potential use of ruthenium as bottom electrode capacitor for next-generation DRAM devices [40] has been explored. Owing to the fact that a dry-etch process can lead to the formation of toxic RUO4 [41], the possibility of using CMP to implement Ru has gained interest recently. The studies in this area have indicated that the formation of stable passive layers such as RUO2 [41,42] and RU2O5 [42] are important steps in the Ru CMP. 

Periodates, as oxidants 1267, 1270 Periodic acid, as oxidant 1267, 1270, 1271 Permethylation 941 Peroxidases 974... 

---