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Pattern Formation by Electric-Field-Induced Dewetting

2 Pattern Formation by Electric-Field-Induced Dewetting [Pg.544]

It was demonstrated that by applying an electrical field to a metastable thin film/ electrostatic pressure could amplify surface fluctuations. This property has been used to tune the size of the self-assembled structures from micron to submicron scale in electrically induced dewetting. Furthermore the possibility to apply a sufficiently strong electric field in defined regions allows the fabrication of a variety of patterns controlling size and positioning.  [Pg.544]

In their work the authors proved that by increasing the electrical field up to a threshold value, the surface waves are amplified until the formation of polymer pillars. Evidence for both nucleated and [Pg.544]

As PS pillars grow, circular rims around the pillars where an unstable PMMA thin film is exposed to the air are formed. At this point a second instability upon the electrical field occurs at the PMMA-air interface. PMMA dewets from the silicon surface, reorganizing around the PS pillars (Fig. 14.12b). The final morphology consists of PS columns coated by a thin layer of PMMA (Fig. 14.12c). [Pg.545]

At the end of the process, a thin layer of PM MA remains, covering the entire substrate. As it is shown in Fig. 14.13b the method was extended from pillars to lines. [Pg.546]




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Dewetting

Electric field pattern

Field induced

Formation fields

Induced pattern

Pattern electric field-induced

Pattern formation

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