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Oxidation-enhanced diffusion impurities

Equation 36 is divided into the contributions to the diffusion of substitutional impurity under nonoxidizing conditions, DSI, and the enhanced contribution due to oxidation, AD0. Figure 16 shows the data of Taniguchi et al. (44) for oxidation-enhanced diffusion of P and B versus the total number of dopant impurities per square centimeter, QT. The calculated values of DSI and AD0 are shown in comparison with the experimental data. Reasonable agreement is obtained. Thus, Taniguchi s model of self-interstitial recombination with vacancies is consistent with the models of high-concentration diffusion of B and P used by Fair in his calculations. [Pg.299]

Figure 16. Measured and calculated values of boron and phosphorus diffusiv-ities as a function of total impurity doping. Data are divided into contributions to substitutional impurity diffusion under nonoxidizing conditions, DSj, and the enhanced contribution due to oxidation, AD0. Data are from Taniguchi et al. (44). (Reproduced with permission from reference 45. Copyright 1981 The Electrochemical Society, Inc.)... Figure 16. Measured and calculated values of boron and phosphorus diffusiv-ities as a function of total impurity doping. Data are divided into contributions to substitutional impurity diffusion under nonoxidizing conditions, DSj, and the enhanced contribution due to oxidation, AD0. Data are from Taniguchi et al. (44). (Reproduced with permission from reference 45. Copyright 1981 The Electrochemical Society, Inc.)...
Enhancement of reactivity of incendiary components has been claimed by the introduction of impurity states, particularly into metallic oxides (Refs 56 86). Impurity states have a twofold effect they disturb the lattice structure of the oxide (and[ so increase the diffusivity of the reactants), and they disturb the electronic distribution on the surface as well as in the bulk. The argument is made that by doping the oxide, or by controlling the formation temp, one may change an oxide from an n-type to a p-type semiconductor and hence cause it to become a better electron acceptor, and vice versa... [Pg.990]

Historically, stabilized (and partially stabilized) zirconia ceramics were prepared from powders in which the component oxides are mechanically blended prior to forming and sintering. Because solid state diffusion is sluggish, firing temperatures in excess of 1800°C are normally required. Furthermore, the dopant was nonuniformly distributed, leading to inferior electrical properties. Trace impurities in the raw materials can also lead to enhancement of electronic conductivity in certain temperature ranges, which is also undesirable. To overcome these problems, several procedures have been developed to prepare reactive (small particle size) and chemically pure and homogeneous precursor powders for both fully stabilized and partially stabilized material. Two of these are alkoxide synthesis and hydroxide coprecipitation. [Pg.372]


See other pages where Oxidation-enhanced diffusion impurities is mentioned: [Pg.293]    [Pg.298]    [Pg.214]    [Pg.374]    [Pg.330]    [Pg.331]    [Pg.80]    [Pg.201]    [Pg.260]    [Pg.117]    [Pg.446]    [Pg.114]    [Pg.509]    [Pg.40]    [Pg.26]    [Pg.1640]    [Pg.41]    [Pg.877]    [Pg.718]    [Pg.130]    [Pg.833]    [Pg.52]    [Pg.280]    [Pg.168]    [Pg.160]    [Pg.184]   
See also in sourсe #XX -- [ Pg.290 ]




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Diffusion enhancement

Diffusion-enhanced

Impurities oxidation

Impurity diffusion

Impurity diffusivity

Oxidation diffusion

Oxidation-enhanced diffusion

Oxidation-enhanced diffusion diffusing impurity

Oxidation-enhanced diffusion diffusing impurity

Oxidizing impurities

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